Fast deposition of diamond-like hydrogenated carbon films

Zaharia, T.; Sullivan, J.L.; Saied, S.O.; Bosch, Robert; Bijker, M.D.

doi:10.1016/j.diamond.2006.11.055

Cited by 17 publications

(13 citation statements)

References 25 publications

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“…The main advantage of this technique is the generation of high concentration of the reactive species (radicals, atoms) that can form a coating with high deposition rates due to steep gradients in the boundary layer plasma -substrate. It has been obtained that the growth rate of hydrogenated amorphous carbon films (a-C:H) or polycrystalline diamonds produced by arc plasma jet technique can reach up to 100 nm/s [4][5][6][7]. Meanwhile, the growth rates of a-C:H obtained by traditional chemical vapour deposition (CVD) or physical vapour deposition (PVD) techniques are ten or hundred times lower compared to the arc plasma jet [8][9][10][11][12].…”

Section: Introductionmentioning

confidence: 99%

“…However, it poses a new challenge: to find optimal process conditions for the deposition of carbon films with desirable mechanical, optical properties. Zaharia et al [5] have determined that the deposition rates in the acetylene gas is seven times greater than in methane. Benedikt et al [6,7] investigated the influence of the argon-acetylene gas ratios on ISSN 1648-8504 the a-C:H films growth kinetics and properties.…”

Section: Introductionmentioning

confidence: 99%

“…Many authors [4][5][6][7][8][9][10][11][12] have demonstrated that the hydrogen concentration and corresponding proportion of the sp 2 and sp 3 carbon sites in the films determines the properties of carbon coatings. Variation of the deposition process parameters allows one to control and produce a-C:H films with desirable properties.…”

Section: Introductionmentioning

confidence: 99%

“…Variation of the deposition process parameters allows one to control and produce a-C:H films with desirable properties. It has been demonstrated that the type of hydrocarbon gases and its amount in plasma, the power of the torch, the pressure, the substrate temperature, and the plasma torch construction are very important factors during the deposition of films by plasma jet CVD [4][5][6][7].…”

Section: Introductionmentioning

confidence: 99%

“…The second advantage of this technique is the formation of carbon films at the atmospheric pressure conditions. However, despite these advantages, the deposition of a-C:H coatings is a complicated process and depends on many different factors [4][5][6][7].…”

Section: Introductionmentioning

confidence: 99%

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Influence of torch power and Ar/C₂H₂ratio on structure of amorphous carbon films

Marcinauskas¹,

Grigonis²,

Valincius³

et al. 2009

Lithuanian J. Phys.

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The amorphous hydrogenated carbon films (a-C:H) were formed on the stainless steel substrates from an argon-acetylene gas mixture at atmospheric pressure using a direct current plasma torch discharge. The carbon films were deposited using Ar/C2H2 gas volume ratios 100:1, 150:1, and 200:1 and plasma torch power of 600 and 870 W. It has been obtained that the increase of the torch power leads to higher film growth rate and increases surface roughness. The growth rate varies from 20 up to 425 nm/s depending on the coating formation conditions. The structure and dominant bonds of the films were investigated by Fourier transform infrared (FTIR) and Raman spectroscopy (RS) measurements. RS results indicated that the sp 2 /sp 3 content in the films depended on the torch power and C2H2 amount in argon plasma. It was demonstrated that a diamond-like / graphite-like carbon and glassy carbon films could be deposited by varying the Ar/C2H2 ratio and plasma torch power.

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Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 3 more Smart Citations

Influence of torch power and Ar/C₂H₂ratio on structure of amorphous carbon films

Marcinauskas¹,

Grigonis²,

Valincius³

et al. 2009

Lithuanian J. Phys.

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Low‐Pressure PECVD of Nanoparticles in Carbon Thin Films from Ar/H₂/C₂H₂ Plasmas: Synthesis of Films and Analysis of the Electron Energy Distribution Function

Camero

Gordillo‐Vázquez²,

Gómez‐Aleixandre

2007

Chemical Vapor Deposition

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A study of the synthesis of carbon nanoparticles embedded in carbon thin films deposited by radiofrequency (RF) (13.56 MHz) Ar/H 2 (4 %)/C 2 H 2 plasmas is presented. The carbon nanospheres exhibit an amorphous structure that is clearly observed at 300 W, under 0.1 Torr, and grows in size with increasing C 2 H 2 between 1 % and 20 %. Above a C 2 H 2 concentration threshold (20 % in this case) carbon nanoparticles are no longer formed. In order to study possible changes in the plasma kinetics, optical emission spectroscopy (OES) is used to evaluate the electron temperature while changing the C 2 H 2 concentration. In addition, an analysis of the temporal evolution of the electron energy distribution function (EEDF) is carried out for various C 2 H 2 concentrations considering the effects produced by electron-vibrational superelastic collisions and relative concentration of excited Ar atoms. Finally, the morphological and tribological features of the deposited films are characterized.

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Low Temperature Nano-Tribological Study on a Functionally Graded Tribological Coating Using Nanoscratch Tests

et al. 2011

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Previous studies on low temperature tribological investigations were limited to macro-scale studies because of the lack of suitable instrumentation. This limitation has been overcome using a newly developed low temperature nanoscratch tester capable of characterizing the scratch resistance of coatings down to -30°C. The scratch resistance and mechanical properties of a functionally graded a-C:H(Ti)/ TiCN/TiN/Ti coating have been investigated for temperatures ranging from 25 to -30°C. It has been found that the a-C:H(Ti)/TiCN/TiN/Ti coating failed at high loads by cracking and spallation during the room-temperature scratch tests. Fractography suggests that these failures originate from or close to the interface between the top a-C:H(Ti) and the TiCN layers. Decreasing the test temperature from 25 to 0°C resulted in increased values in H, H/E r and H 3 /E r 2 , consistent with improved crack-and wear resistances, with further smaller improvements being achieved on further decreasing the temperature to -30°C.

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Fast deposition of diamond-like hydrogenated carbon films

Cited by 17 publications

References 25 publications

Influence of torch power and Ar/C₂H₂ratio on structure of amorphous carbon films

Influence of torch power and Ar/C₂H₂ratio on structure of amorphous carbon films

Low‐Pressure PECVD of Nanoparticles in Carbon Thin Films from Ar/H₂/C₂H₂ Plasmas: Synthesis of Films and Analysis of the Electron Energy Distribution Function

Low Temperature Nano-Tribological Study on a Functionally Graded Tribological Coating Using Nanoscratch Tests

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Fast deposition of diamond-like hydrogenated carbon films

Cited by 17 publications

References 25 publications

Influence of torch power and Ar/C2H2ratio on structure of amorphous carbon films

Influence of torch power and Ar/C2H2ratio on structure of amorphous carbon films

Low‐Pressure PECVD of Nanoparticles in Carbon Thin Films from Ar/H2/C2H2 Plasmas: Synthesis of Films and Analysis of the Electron Energy Distribution Function

Low Temperature Nano-Tribological Study on a Functionally Graded Tribological Coating Using Nanoscratch Tests

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Product

Resources

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Influence of torch power and Ar/C₂H₂ratio on structure of amorphous carbon films

Influence of torch power and Ar/C₂H₂ratio on structure of amorphous carbon films

Low‐Pressure PECVD of Nanoparticles in Carbon Thin Films from Ar/H₂/C₂H₂ Plasmas: Synthesis of Films and Analysis of the Electron Energy Distribution Function