Fast deposition of metallurgical coatings and production of surface alloys using a pulsed high current vacuum arc

Boxman, R.L.; Goldsmith, S.; Shalev, S.; Yaloz, H.; Brosh, Nisan

doi:10.1016/0040-6090(86)90046-5

Cited by 56 publications

(11 citation statements)

References 11 publications

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“…Vacuum arc deposition is a widely used, plasma-based technology for the fabrication of thin films and coatings. [1][2][3][4] Metal plasma in abundance is produced at the cathode of the arc, pluming away from the solid electrode in a way reminiscent of a laser-produced plasma. The technique provides a versatile and powerful plasma tool for the synthesis of novel and technically important surfaces.…”

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confidence: 99%

Experimental investigation of electron oscillation inside the filter of a vacuum arc plasma source

Kwok

Zhang

Chu

et al. 2001

Applied Physics Letters

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We report here experimental evidence of electron oscillation within the toroidal-section magnetic duct of a filtered vacuum arc plasma source. Our results clearly demonstrate that electrons can oscillate inside the duct under the combined effects of the electric and magnetic fields. In another experiment, we observe that, under the influence of the electron motion, the trajectories of the plasma ions are more or less unchanged except in the intensity when the Bilek plate is biased. Finally, our time-of-flight experiments show that the effects due to collisional scattering between plasma ions and oscillating electrons are masked by those associated with the metal plasma flow through the duct, and collisional scattering does not give rise to an increase of the mean charge state of the plasma ions. We conclude that the application of a bias voltage to the duct not only perturbs the ions but also influences the plasma electrons. Our results demonstrate that electrons at the central axis are one of the major reasons leading to improved plasma transport through the duct.

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confidence: 99%

Experimental investigation of electron oscillation inside the filter of a vacuum arc plasma source

Kwok

Zhang

Chu

et al. 2001

Applied Physics Letters

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“…The magnetic field is generated by the coils surrounding the duct. The field at a point due to an element of the duct coil is represented by (1) where permeability of free space; current in the duct coils; number of turns per unit length; length of the element along ; vector between the point and the element; vector tangent to the surface of the duct [18]. The ultimate magnetic field at a point in space can be calculated by integrating (1) for all the duct coils.…”

Section: Theoretical Simulationmentioning

confidence: 99%

Ion mean charge state in a biased vacuum arc plasma duct

Kwok

Chu²,

Bilek³

et al. 2000

IEEE Trans. Plasma Sci.

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Vacuum arc or cathodic arc metal plasma sources are attractive and convenient for depositing high-quality thin metal films and metallurgical coatings. It is a common practice to use a curved magnetic filter duct to eliminate macroparticle contamination and to bias the duct wall with a positive voltage to enhance the throughput of the metal plasma. The metal plasma usually consists of several charge states and time-of-flight (TOF) experiments show that the mean charge state of the metal ions decreases with increasing bias and magnetic field applied to the filter duct. We also derive the throughput of ions with different charge states at different bias voltage and magnetic field by the particle-in-cell (PIC) method. The ion trajectory is simulated neglecting the influence of electron charge. Our results show that the simulated mean charge state displays a similar decreasing trend as the bias voltage and magnetic field strength are increased. Phenomena such as reduction of the mean charge state at high magnetic field strength and bias can be explained in terms of standalone multiply charged metal ions under the influences of magnetic and electric forces inside the filter duct. Index Terms-Ion charge states, plasma duct, vacuum arc sources. I. INTRODUCTION V ACUUM arc or cathodic arc metal plasma sources are widely used in plasma-based applications especially for the fabrication of thin films and coatings [1]-[4]. The process can be carried out either at high vacuum or in a low-pressure gaseous environment, and films can be composed of metals, ceramics, diamond-like carbon, some semiconductors and superconductors, and other materials. The method is thus a versatile and powerful plasma tool for the synthesis of novel and technologically interesting surfaces. The contamination of the thin metal films by macroparticles, droplets of resolidified cathode debris of dimensions in the broad range from 0.1 to 10 m, is the major disadvantage precluding a wide application of vacuum arc plasma sources in industry. Macroparticle contamination in general leads to imperfect films, and it is often important Manuscript

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“…10,11 The study of the outer region of the discharge when the arc is operated with neutral gas filling is important because in this region, the ions lose their kinetic energy by elastic collisions with the neutral particles and some of them are recombined through inelastic processes in the neutral gas. Only a few theoretical studies have been presented on this subject, and they were concerned with the small-gap facedelectrodes geometrical configuration quoted above.…”

Section: Introductionmentioning

confidence: 99%

Structure of plasmas generated by the interaction between metallic ions and neutral gas particles in a low-pressure arc

Kelly

Lepone

Minotti

2000

Journal of Applied Physics

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A numerical solution for the metallic-plasma-neutral-gas structure generated in a low-pressure arc is presented. The equations correspond to a spherically symmetric fluid-like steady model, valid for the outer region of the arc, and describe the ion slowing down by elastic scattering with the neutral particles. Technically, the obtention of the profiles of different magnitudes is complicated due to the existence of a critical point in the steady-state system of equations. The proposed approach to overcome this difficulty is to solve instead a pseudotransient system of equations which rapidly and efficiently relax to the stationary state. By employing this numerical method of second-order accuracy in space, the plasma and neutral gas density, the electron and ion drift velocities, the electron and neutral temperatures, and the electrostatic potential profiles are obtained from the border of the arc channel up to the discharge chamber wall. It is found that the value of the neutral gas filling pressure strongly influences the plasma density and plasma potential distributions. An important result is that metallic ions emitted from the arc channel deliver their kinetic energy to the filling gas in a gradual manner, up to a pressure-dependent point beyond which they move to the walls sustained against collisions with the gas by a self-consistent electric field. Near the mentioned point, the metallic ion density presents a peculiar behavior, showing an increase that is more pronounced at high pressures; a pattern also evident in the electrostatic potential.

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Fast deposition of metallurgical coatings and production of surface alloys using a pulsed high current vacuum arc

Cited by 56 publications

References 11 publications

Experimental investigation of electron oscillation inside the filter of a vacuum arc plasma source

Experimental investigation of electron oscillation inside the filter of a vacuum arc plasma source

Ion mean charge state in a biased vacuum arc plasma duct

Structure of plasmas generated by the interaction between metallic ions and neutral gas particles in a low-pressure arc

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