2011
DOI: 10.1016/j.jallcom.2010.12.208
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FeCoHfN thin films fabricated by co-sputtering with high resonance frequency

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Cited by 46 publications
(18 citation statements)
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“…That explains why there is a spinreorientation behavior. Previously, there were several observations on the magnetic anisotropy induced by the composition gradient in the magnetic thin films fabricated by sputtering technique with special set up [17,18]. Our interpretation of this behavior in terms of the gradient composition influence is thus quite reasonable.…”
Section: Resultssupporting
confidence: 56%
“…That explains why there is a spinreorientation behavior. Previously, there were several observations on the magnetic anisotropy induced by the composition gradient in the magnetic thin films fabricated by sputtering technique with special set up [17,18]. Our interpretation of this behavior in terms of the gradient composition influence is thus quite reasonable.…”
Section: Resultssupporting
confidence: 56%
“…Clearly seen is the increasing of both f FMR and H K in a similar manner with the increasing of P Ta . Previous studies [11][12][13][14][15][16][17] of the films grown by this gradient-composition sputtering technique revealed that the magnetic anisotropy present in these kinds of films arises from the stress-induced origin. Specifically, the stress-induced magnetic anisotropy, which is also known as magneto-elastic anisotropy, in these films can be expressed as [11][12][13][14][15][16][17] …”
Section: Methodsmentioning
confidence: 93%
“…The stress r takes a positive value for the case of tensile stress while it takes a negative value for a compressive stress. [11][12][13][14][15][16][17] The stress of the films in our case arises from the composition gradient distribution of Ta along the hard axis owing to the fact that the atomic radius of Ta is larger than that of Fe or Co and thus a substitution of Ta atoms into Fe or Co sites creates some stress imposed on the films. [11][12][13][14] Normally, the stress created from such a substitution is isotropic and consequently causes no stress-induced anisotropy because the resultant sum of the stress is zero in any direction.…”
Section: Methodsmentioning
confidence: 99%
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“…And the loop of low-oblique-deposition-angle deposited sample showed a significantly higher remanence than that of the large-angle deposited one. With the deposition angle increasing, the induced magnetic anisotropy field H k increased concurrently with the more relatively uniform distribution of H k [39]. As a result, the decrease in a eff with deposition angle occurred as shown in Fig.…”
Section: Resultsmentioning
confidence: 74%