Articles you may be interested inStructure and properties of W O 3 -doped Pb 0.97 La 0.03 ( Zr 0.52 Ti 0.48 ) O 3 ferroelectric thin films prepared by a sol-gel process J. Appl. Phys. 98, 034104 (2005); Spatial variation of ferroelectric properties in Pb(Zr 0.3 ,Ti 0.7 )O 3 thin films studied by atomic force microscopy Dielectric and ferroelectric response as a function of annealing temperature and film thickness of sol-gel deposited Pb(Zr 0.52 Ti 0.48 )O 3
thin filmWe report on the synthesis of polycrystalline thin films of PbZr 0.3 Ti 0.7 O 3 ͑PZT͒ by the so-called chemical solution deposition technique. The thin films were deposited on Pt/ Ti/ SiO 2 / Si substrates by the spin-coating method, and were heat treateded at 700°C in air and under several oxygen pressures ͑10Ͻ P O 2 Ͻ 60 bars͒. The structural, morphological, and ferroelectric properties were characterized by x-ray diffraction ͑XRD͒, infrared and Raman spectroscopy, atomic force microscopy ͑AFM͒, and polarization-electric-field hysteresis loop measurements. The XRD and the Raman spectroscopy results revealed that the films heat treated in air and at low oxygen pressures ͑P O 2 Ͻ 40 bars͒ are single phase. However, analysis of the data indicated a clear decreasing of the crystallization degree of the films with increasing oxygen pressure. AFM results showed the PZT films display a rosette structure embedded in a matrix, which comprises grains with an average grain size ranging from 60 to 120 nm. Ferroelectric hysteresis loops' measurements performed on these PZT films exhibited a clear decrease of the remnant polarization with increasing oxygen-pressure P O 2 . This study indicated some important effects of the high oxygen-pressure annealing on the physical properties of PZT thin films.