2011
DOI: 10.1111/j.1365-2818.2011.03510.x
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FIB-SEM cathodoluminescence tomography: practical and theoretical considerations

Abstract: Focused ion beam-scanning electron microscope (FIB-SEM) tomography is a powerful application in obtaining three-dimensional (3D) information. The FIB creates a cross section and subsequently removes thin slices. The SEM takes images using secondary or backscattered electrons, or maps every slice using X-rays and/or electron backscatter diffraction patterns. The objective of this study is to assess the possibilities of combining FIB-SEM tomography with cathodoluminescence (CL) imaging. The intensity of CL emiss… Show more

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Cited by 14 publications
(13 citation statements)
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“…These estimates also provide an estimation for the resolution limit of SEM-CL images, because the CL emission at any point in the sample will be an average of the CL emission of the whole interaction volume of the electron beam with the sample. Interestingly, fast ion bombardment with gallium ions used to prepare the TEM sections did not destroy the CL signal, in agreement with CL studies on diamond (De Winter et al 2011).…”
Section: Discussionsupporting
confidence: 70%
“…These estimates also provide an estimation for the resolution limit of SEM-CL images, because the CL emission at any point in the sample will be an average of the CL emission of the whole interaction volume of the electron beam with the sample. Interestingly, fast ion bombardment with gallium ions used to prepare the TEM sections did not destroy the CL signal, in agreement with CL studies on diamond (De Winter et al 2011).…”
Section: Discussionsupporting
confidence: 70%
“…These image stacks are often acquired at a 38°angle Hekking et al, 2009), and as a result, the imaged Y-resolution is a condensed representation of the sample (De Winter et al, 2011). Moreover, the pixel-size 1047-8477/$ -see front matter Ó 2011 Elsevier Inc. All rights reserved.…”
Section: Introductionmentioning
confidence: 99%
“…tual pixel-size of 3.17 nm/px in Y through the formula [1/cos /], where / is the acquisition-angle(De Winter et al, 2011)) with a Z-slice thickness of 40 nm. The FIB-SEM tomogram was obtained perpendicular to the vessel-wall.…”
mentioning
confidence: 99%
“…This is sufficient to avoid electron beam charging and damage, even for non-conductive materials. The interaction volume between Ga and the material is much smaller than that of electrons; the ions accelerated by a 30 kV voltage can penetrate tens of nanometres into the surface compared to microns for electrons with the same acceleration voltage [67,68]. Thus, for ion beam imaging and slice milling, a Pt-layer of about 1 µm deposited in situ was made to protect the ROI.…”
Section: Instrument Setup To Limit Artefacts During Sample Analysismentioning
confidence: 99%