Focused Ion Beam Assisted Interface Detection for Fabricating Functional Plasmonic Nanostructures

Abstract

Plasmonic nanoscale devices/structures have gained more attention from researchers due to their promising functions and/or applications. One important technical focus on this rapidly growing optical device technology is how to precisely control and fabricate nanostructures for different functions or applications (i.e., patterning end points should locate at/near the interface while fabricating these plasmonic nanostructures), which needs a systematic methodology for nanoscale machining, patterning, and fabrication when using the versatile nanoprecision tool focused ion beam (FIB), that is, the FIB-assisted interface detection for fabricating functional plasmonic nanostructures. Accordingly, in this work, the FIB-assisted interface detection was proposed and then successfully carried out using the sample-absorbed current as the detection signal, and the real-time patterning depth control for plasmonic structure fabrication was achieved via controlling machining time. Besides, quantitative models for the sample-absorbed currents and the ion beam current were also established. In addition, some nanostructures for localized surface plasmon resonance biosensing applications were developed based on the proposed interface detection methodology for FIB nanofabrication of functional plasmonic nanostructures. It was shown that the achieved methodology can be conveniently used for real-time control and precise fabrication of different functional plasmonic nanostructures with different geometries and dimensions.

Recent advances in nanoplasmonic biosensors: applications and lab-on-a-chip integration

“…Bottom-up methods based on the chemical synthesis of nanoparticles [21] or colloidal lithography [22,23] fulfill some of these aspects, although top-down approaches [24] are also providing less expensive methods compared to traditional electron beam lithography (EBL) [25] or focus ion beam (FIB) [26,27]. Nanostencil lithography (NSL) based on shadow-masked patterning of the nanostructure [28], nanoimprint lithography that creates nanopatterns by the mechanical deformation of imprint resist [29], and interference lithography where an interference pattern is recorded in a photoresist material [30] are processes that can achieve market significance by offering simple, scalable, and cost-effective fabrication methods and have also the possibility of using flexible substrates.…”

Interface Dependent Plasmon Induced Enhancement in Dye‐Sensitized Solar Cells Using Gold Nanoparticles

“…Great advances in nanofabrication have allowed the study of well-organized nanostructure arrays, such as nanoholes and surface relief gratings, providing better comprehension and description of the plasmon propagation modes [1][2][3][4][5][6][7][8]. Nevertheless, metallic nanoparticles presenting wellcontrolled shape and small size distribution have been attracting increasing attention, due to simple and efficient synthetic approaches, which requires minimum apparatus [9,10].…”