“…Limited amount of preferential milling occurs because the ion beam is near perpendicular to the sample. This has enabled lamellae to be prepared of polymers on glass (Loos et al, 2003) and silicon (White et al, 2001), imprinted poly(methyl methacrylate) on silicon (Langford et al, 2002a,b,c), and patterned photoresist on silicon (De Veirman and Weaver, 1999). Figure 1a shows a FIB cross-section through a nanoindent in a 2-lm-thick polyvinyl acetate film on silicon.…”