Indirect band gap semiconductor materials
are routinely exploited
in photonics, optoelectronics, and energy harvesting. However, their
optical conversion efficiency is low, due to their poor optical properties,
and a wide range of strategies, generally involving doping or alloying,
has been explored to increase it, often, however, at the cost of changing
their material properties and their band gap energy, which, in essence,
amounts to changing them into different materials altogether. A key
challenge is therefore to identify effective strategies to substantially
enhance optical transitions at the band gap in these materials without
sacrificing their intrinsic nature. Here, we show that this is indeed
possible and that GaP can be transformed into a direct gap material
by simple nanostructuring and surface engineering, while fully preserving
its “identity”. We then distill the main ingredients
of this procedure into a general recipe applicable to any indirect
material and test it on AlAs, obtaining an increase of over 4 orders
of magnitude in both emission intensity and radiative rates.