Formation of nanoimprinting mould through use of nanosphere lithography

Colloidal Lithography

“…Ordered arrays of polyacrylic acid domes have been fabricated by using 2D PS colloidal crystals as masks for O 2 RIE of the polymeric films; the removal of the PS masks has no damage to the surface chemistry and the structure of the resulting polymeric domes, thus enabling conjugation of proteins [55]. 2D PS colloidal crystals have been also used as masks for dry etching of SiO 2 slides to create periodic arrays of nanoplates, which can be transferred onto polymer films by imprinting [56]. Using colloidal crystals as masks for catalytic etching, Zhu et al have fabricated large-scale periodic arrays of silicon nanowires and the diameters and heights of the nanowires and the center-to-center distances between the nanowires can be accurately controlled [57].…”

High efficiency triple-junction solar cells employing biomimetic antireflective structures

“…The biomimetic structures are fabricated on the silicon nitride (SiNx) passivation layer using polystyrene nanosphere lithography followed by anisotropic etching. The technique provides a relatively simple, scalable, and cost-effective means to control the structural profile [10,[15][16][17][18][19][20][21], while minimizing the surface recombination current arising from etching. Under one-sun illumination, the shortcircuit current of a cell with the SWS ARC is enhanced by 24.1% and 2.2% due to much improved optical transmission and current matching, compared to cells without a ARC and with a conventional single-layer (SL) ARC, respectively.…”

An Antireflective Nanostructure Array Fabricated by Nanosilver Colloidal Lithography on a Silicon Substrate

“…Master patterns required for molding can be fabricated by e-beam [5], interference lithography [8,9], anodizing aluminum oxide [10,11], colloidal nanolithography using polystyrene [12-14], and electron cyclotron resonance (ECR) plasma etching [15,16]. Although molding technology is favorable for mass production, the high cost of mask preparation and the limited resources for large-area mask patterning frequently restrict its practical applications.…”