Formation of self-assembled nanoscale graphene/graphene oxide photomemristive heterojunctions using photocatalytic oxidation

Kapitanova, Olesya O.; Panin, G. N.; Cho, Hak Dong; Баранов, А. Н.; Kang, Tae Won

doi:10.1088/1361-6528/aa655c

Cited by 16 publications

(13 citation statements)

References 32 publications

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“…O. O. Kapitanova et al [58] exploited the photocatalytic oxidation of graphene to generate graphene/graphene oxide (G/GO) photosensitive heterostructures, which could be used as memristors. Photoactive ZnO nanoparticles were deposited on multilayer graphene, which was then irradiated with UV light (≤365 nm, 0.03 J min −1 cm −2 ) under a flow of humid air for different times (from 5 to 90 min) at different temperatures (room temperature or 80 • C).…”

Section: Patterning Of Graphene and Graphene Oxidementioning

confidence: 99%

Photocatalytic Lithography

Panzarasa

Soliveri

2019

Applied Sciences

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Patterning, the controlled formation of ordered surface features with different physico-chemical properties, is a cornerstone of contemporary micro- and nanofabrication. In this context, lithographic approaches owe their wide success to their versatility and their relative ease of implementation and scalability. Conventional photolithographic methods require several steps and the use of polymeric photoresists for the development of the desired pattern, all factors which can be deleterious, especially for sensitive substrates. Efficient patterning of surfaces, with resolution down to the nanometer scale, can be achieved by means of photocatalytic lithography. This approach is based on the use of photocatalysts to achieve the selective chemical modification or degradation of self-assembled monolayers, polymers, and metals. A wide range of photoactive compounds, from semiconducting oxides to porphyrins, have been demonstrated to be suitable photocatalysts. The goal of the present review is to provide a comprehensive state-of-the-art photocatalytic lithography, ranging from approaches based on semiconducting oxides to singlet oxygen-based lithography. Special attention will be dedicated to the results obtained for the patterning of polymer brushes, the sculpturing of metal nanoparticle arrays, and the patterning of graphene-based structures.

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Section: Patterning Of Graphene and Graphene Oxidementioning

confidence: 99%

Photocatalytic Lithography

Panzarasa

Soliveri

2019

Applied Sciences

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“…The mechanism of resistive switching in G/GO was studied in detail in a number of works [12][13][14][15][16][17] in which it was shown that the migration of oxygen-containing groups in GO plays an important role. One sp 3 carbon-oxygen or carbon-hydroxyl bond on 10 6 sp 2 bonds reduced conductivity in carbon nanomaterials by 50% [18].…”

Section: The Mechanism Of Resistive Switching In Graphene/graphene Oxidementioning

confidence: 99%

“…The photocatalytic oxidation of graphene coated with a layer of 10-15 nm ZnO nanoparticles under ultraviolet (UV) irradiation conditions led to the formation of self-organized G/GO memristors with very high density (10 12 cm −2 ) [16,17]. Figure 7 shows the scheme of photocatalytic oxidation of graphene with ZnO nanoparticles.…”

Section: Self-organization Of Memristors Based On Graphene/graphene Omentioning

confidence: 99%

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Memristive Systems Based on Two-Dimensional Materials

Panin¹,

Kapitanova²

2018

Advances in Memristor Neural Networks - Modeling and Applications

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The unique electronic and optical properties of newly discovered 2D crystals such as graphene, graphene oxide, molybdenum disulfide, and so on demonstrate the tremendous potential in creating ultrahigh-density nano-and bioelectronics for innovative image recognition systems, storage and processing of big data. A new type of memristors with a floating photogate based on biocompatible graphene and other 2D crystals with extremely low power consumption and footprint is considered. The photocatalytic oxidation of graphene is proposed as an effective method of creating synapse-like 2D memristive devices with photoresistive switching for nonvolatile electronic memory of ultrahigh density. Particular attention is paid to the new concept of the formation of self-assembled nanoscale memristive elements interfacing artificial electronic neural networks. 2D photomemristors with a floating photogate exhibit multiple states controlled in a wide range of electromagnetic radiation and can be used for neuromorphic computations, pattern recognition and image processing needed to create artificial intelligence.

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“…The unique electronic and optical properties of graphene oxide demonstrate a huge potential for designing ultrahigh density memristive elements to be used as interfaces with electronic artificial neural networks. The different degree of reduction/oxidation of graphene oxide/graphene allows monitoring multiple memristive states in a wide spectral range by using electric and optic excitation [15]. Non-volatile resistive memory (NVM) devices allow creation of efficient systems for analog and neuromorphic computation in the field of large data and artificial intelligence [16].…”

Section: Introductionmentioning

confidence: 99%