2019
DOI: 10.1088/1742-6596/1410/1/012042
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Formation of SiO2 buffer layer for LiNbO3 thin films growth

Abstract: This paper shows the results of study of the effect of SiO2 buffer layer thickness on the morphological parameters of nanocrystalline LiNbO3 films formed by pulsed laser deposition. It has been established that with increasing in the thickness of SiO2 buffer layer from 10 nm to 50 nm, the roughness of LiNbO3 films decreases from 5.1 nm to 4.4 nm. The minimum value of the grain diameter (118 nm) corresponds to the thickness of the buffer layer equal to 50 nm. The results obtained can be used in the design and m… Show more

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Cited by 2 publications
(2 citation statements)
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“…Films are obtained with a thickness of 45-90 nm at the heater temperature of 600 • C on SiO 2 (100 nm)/Si structures. The effect of the SiO 2 buffer layer thickness on the morphological parameters of LiNbO 3 films is presented in [40].…”
Section: Experimental Methodsmentioning
confidence: 99%
“…Films are obtained with a thickness of 45-90 nm at the heater temperature of 600 • C on SiO 2 (100 nm)/Si structures. The effect of the SiO 2 buffer layer thickness on the morphological parameters of LiNbO 3 films is presented in [40].…”
Section: Experimental Methodsmentioning
confidence: 99%
“…Pulsed laser deposition (PLD) is mostly used for the growth of complex oxides [32][33][34][35] and when a particular threshold value of the laser power density is exceeded, stoichiometric growth of films is possible [36]. However, the physical mechanisms underlying this phenomenon have not yet been clarified [37].…”
Section: Introductionmentioning
confidence: 99%