2011
DOI: 10.1063/1.3638490
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Forming-free resistive switching behavior in Nd2O3, Dy2O3, and Er2O3 films fabricated in full room temperature

Abstract: In this study, we reported the forming-free resistive switching behavior in the Ru/RE2O3/TaN (RE = Nd, Dy, and Er) memory devices using thin Nd2O3, Dy2O3, and Er2O3 films fabricated with full room temperature process. The dominant conduction mechanisms of the Ru/RE2O3/TaN devices in the low-resistance state and high-resistance state are Ohmic behavior. The Ru/Dy2O3/TaN memory device exhibited high resistance ratio, nondestructive readout, reliable data retention, and good endurance. Ru/Dy2O3/TaN memory device … Show more

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Cited by 72 publications
(25 citation statements)
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“…It should be mentioned that, in agreement with other observations related on thin "bulk" films, 14,15 no forming process 16 is needed in order to achieve the resistance switching operation. The devices are initially found in the HRS and switching to the LRS occurs as soon as the set voltage of þ0.5 V is reached.…”
supporting
confidence: 84%
“…It should be mentioned that, in agreement with other observations related on thin "bulk" films, 14,15 no forming process 16 is needed in order to achieve the resistance switching operation. The devices are initially found in the HRS and switching to the LRS occurs as soon as the set voltage of þ0.5 V is reached.…”
supporting
confidence: 84%
“…By applying appropriate SET/RESET voltage (V SET =V RESET ) between top and bottom electrodes, the connecting and rupture of conducting filaments are triggered by three major physical mechanisms and results in different bipolar RS (BRS) and unipolar RS (URS) modes, namely electrochemical metallization of metal filaments for BRS, valance change effect of oxygen-vacancy filaments for BRS, and thermochemical effect for URS when Joule heating is predominant at RESET. 2) Among a wide range of materials showing RS phenomena, such as perovskite oxides, ferromagnets, chalcogenides, and binary metal oxides, [3][4][5][6][7][8][9] the binary metal oxides such as HfO 2 have been the most interesting because of their compatibility with advanced CMOS technology. 10,11) Furthermore, the RS modes in RRAM had been shown to depend strongly on the metal electrodes using an identical binary oxide.…”
Section: Introductionmentioning
confidence: 99%
“…The observed in the works under discussion effect of resistive properties of HTSCnormal metal heterojunctions influenced by the electric field is the evidence in favor of a so-called filamentary model with electroforming. Recently several investigations in the field of technologies of non-filamentary nonvolatile memory based on metalinsulator Mott transition in nickel oxide and other transition-metal compounds have appeared [48,49]. It is assumed that electroforming process proves the filamentary mechanism of RS.…”
Section: Prospects Of Usage Of Htsc-based Memristors In Applications mentioning
confidence: 99%