The photoluminescence (PL) and reflection excitonic spectra of GaN epitaxial layers grown on sapphire substrate by MOVPE were measured in the temperature region from 50 to 200 K. A three-layer model of the crystal was used for fitting the reflection spectrum. In this way the dead layer thickness, resonance energies and the broadening parameters of the free excitons were obtained. These parameters were then used for fitting the PL spectra assuming a thermal equilibrium for excitons. A decrease in the diffusion coefficient and increase in the radiative lifetime of excitons was found with increasing temperature.Introduction For the technological development of GaN based optoelectronic devices a detailed knowledge of GaN optical properties is necessary. Analysis of the line shape of free exciton photoluminescence and reflection spectra (RS) can provide a way for the determination of energy structure and estimation of the basic parameters of radiative recombination processes [1,2]. Most of the works have reported on identification of the free exciton states in GaN epitaxial layers in reflection, photoreflection and PL measurements [2][3][4][5]. However many fundamental parameters of exciton states in GaN are still insufficiently investigated. This includes the temperature dependence of the diffusion coefficient and diffusion length of the free excitons, which are connected with the radiative lifetimes. Picosecond time-resolved PL spectroscopy has been used for investigation of recombination processes in GaN [6] yielding the lifetimes of excitons of the order of several tens of picoseconds. However, the study of exciton diffusion processes in GaN encounters experimental difficulties [7]. It was demonstrated in our previous work [2] that analysis of the exciton PL and reflectance line shape in ZnSe epitaxial layers can provide us with this data. This method was applied in the present work to the investigation of the optical spectra of GaN epitaxial layers.