2016 IEEE International Electron Devices Meeting (IEDM) 2016
DOI: 10.1109/iedm.2016.7838403
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Fully coupled 3-D device simulation of negative capacitance FinFETs for sub 10 nm integration

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Cited by 81 publications
(29 citation statements)
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“…An internal metal gate (IMG) has been proposed to be inserted between the NC layer and the underlying MOSFET. It has been found that the IMG induced fringing capacitance (that helps induce further polarization in the NC layer) can help improve SS 21 . The physical mechanism of this effect is well captured by the developed analysis in this work (Supplementary Note 8).…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…An internal metal gate (IMG) has been proposed to be inserted between the NC layer and the underlying MOSFET. It has been found that the IMG induced fringing capacitance (that helps induce further polarization in the NC layer) can help improve SS 21 . The physical mechanism of this effect is well captured by the developed analysis in this work (Supplementary Note 8).…”
Section: Resultsmentioning
confidence: 99%
“…Previous attempts at understanding the workings of NC-FETs either assumed the total FET gate capacitance to be a constant 7,18 , i.e., the bias-dependent channel capacitance was ignored, or were focused on performing intensive numerical simulations [21][22][23][24][25] or complex analytical modeling 26,27 of a specific NC-FET such as NC-FinFET and NC-2DFET etc., in which the generic device physics, design rule and major challenges of NC-FETs get obscured. In this work, we analytically formulate the slope of the transfer characteristics of a generic NC-FET structure, from which a physics-rich but concise picture is innovatively extracted for "visualizing" the intriguing device physics and design space of NC-FETs.…”
mentioning
confidence: 99%
“…The simulation and modeling study of negative capacitance in the MOSFETs has been investigated in the literature [19]- [23]. Also, some studies have been done to investigate the short channel effect in inversion-mode NC FETs, a majority of them being based on detailed simulations [24]- [26]. However, none of them is an analytical charge-based model and there is no evidence of modeling and investigating the short channel effect in NC JLFETs based on solving 2D Poisson-Boltzmann relationships.…”
Section: Introductionmentioning
confidence: 99%
“…FeFET with sub-60mV/dec SS also exhibits unique device characteristics such as reverse drain-induced barrier lowering (R-DIBL) and negative differential resistance (NDR) [6], [19]- [21]. Previously, these special behaviors were predicted by the QSNC theory and regarded as the indication of the stabilized NC in ferroelectric [22]- [24]. The theory of NC needs to give reasonable explanation not only for steep SS but also R-DIBL and NDR consistently.…”
Section: Introductionmentioning
confidence: 99%