2012
DOI: 10.1088/1748-0221/7/02/c02005
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Further developments in gold-stud bump bonding

Abstract: As silicon detectors in high energy physics experiments require increasingly complex assembly procedures, the availability of a wide variety of interconnect technologies provides more options for overcoming obstacles in generic R&D. Gold ball bonding has been a staple in the interconnect industry due to its ease of use and reliability. However, due to some limitations in the standard technique, alternate methods of gold-stud bonding are being developed. This paper presents recent progress and challenges faced … Show more

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Cited by 6 publications
(3 citation statements)
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“…There are, however, some key elements where novel solutions are required. The sensors, like those for the ECAL, employ a double-metal layer to route signals to bump-bonding arrays for readout by the KPiX ASIC [87,88,89]. As with the ECAL, traces on the second metal layer of the sensor connect power and signal lines on the KPiX chip to a readout cable that is also bump bonded to the face of the sensor.…”
Section: Baseline Designmentioning
confidence: 99%
“…There are, however, some key elements where novel solutions are required. The sensors, like those for the ECAL, employ a double-metal layer to route signals to bump-bonding arrays for readout by the KPiX ASIC [87,88,89]. As with the ECAL, traces on the second metal layer of the sensor connect power and signal lines on the KPiX chip to a readout cable that is also bump bonded to the face of the sensor.…”
Section: Baseline Designmentioning
confidence: 99%
“…Based on prior research by other parties, 36 N (80 g/stud) was chosen as the bump coining force and 45 N (100 g/stud) was chosen as the chip bonding force [5][6][7][8].…”
Section: Resultsmentioning
confidence: 99%
“…The most common fabrication approaches for Au bump are the stud method and the electroplating method [42,43]. Electroplating Au bump was seen as an effective way to assemble high power density devices with simple operation and controllable size.…”
Section: Current Density Electroplating Time Electroplating Temperaturementioning
confidence: 99%