2019
DOI: 10.1088/2053-1583/ab4020
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Gas dependent hysteresis in MoS 2 field effect transistors

Abstract: We study the effect of electric stress, gas pressure and gas type on the hysteresis in the transfer characteristics of monolayer molybdenum disulfide (MoS 2 ) field effect transistors. The presence of defects and point vacancies in the MoS 2 crystal structure facilitates the adsorption of oxygen, nitrogen, hydrogen or methane, which strongly affect the transistor electrical characteristics. Although the gas adsorption does not modify the conduction type, we demonstrate a correlation between hysteresis width an… Show more

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Cited by 88 publications
(69 citation statements)
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“…The exponential dependence of H W on the sweeping time [63], (time constant approximately 9 min), reveals a prevalent role of slow trap states related to either MoS 2 or SiO 2 defects compared to the contribution of MoS 2 defects or MoS 2 /SiO 2 interface (fast) traps [64,65]. These results are in agreement with previous experiments on similar devices contacted by Ti/Au (titanium/gold) metal contacts [6,66].…”
Section: Transistor Characterizationsupporting
confidence: 90%
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“…The exponential dependence of H W on the sweeping time [63], (time constant approximately 9 min), reveals a prevalent role of slow trap states related to either MoS 2 or SiO 2 defects compared to the contribution of MoS 2 defects or MoS 2 /SiO 2 interface (fast) traps [64,65]. These results are in agreement with previous experiments on similar devices contacted by Ti/Au (titanium/gold) metal contacts [6,66].…”
Section: Transistor Characterizationsupporting
confidence: 90%
“…The obtained mobility is within the range (0.05 − 70 cm 2 V −1 s −1 ) commonly reported in FETs with a MoS 2 channel on SiO 2 [22,[59][60][61]. Its relatively low value can be caused partially by the high contact resistance but is mainly an indication of a high density of scattering centers, such as intrinsic defects in the crystal structure of MoS 2 , extrinsic traps at the MoS 2 /SiO 2 interface or into the SiO 2 dielectric layer, and charged impurities such as adsorbates on the MoS 2 surface [6].…”
Section: Transistor Characterizationmentioning
confidence: 99%
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“…The isolation of graphene [1][2][3] in 2004 and, later on, of h-BN [4], phosphorene [5], S Mo 2 [6][7][8][9][10][11][12][13][14], WSe 2 [15][16][17], e PdS 2 [18,19], PtSe 2 [20,21] etc, has strongly attracted the interest of the material science community to the world of two-dimensional (2D) materials.…”
Section: Introductionmentioning
confidence: 99%
“…Tremendous amount of work has been done thus far on the physical and chemical properties as well as on the synthesis and the characterization of 2D materials such as graphene [13,14], transition metal chalcogenides [15,16] and dichalcogenides [17][18][19], hexagonal boron nitride [20], black phosphorus [21], organic perovskites [22], etc. Many of these materials have been used to fabricate stacked 2D-2D heterostructures [23], 2D-3D heterojunctions with common bulk semiconductors [24,25], or even 0D-2D and 1D-2D hybrids [26].…”
Section: Introductionmentioning
confidence: 99%