2006
DOI: 10.1016/j.mssp.2006.08.002
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Germanium: From the first application of Czochralski crystal growth to large diameter dislocation-free wafers

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Cited by 103 publications
(65 citation statements)
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“…Ge(100) substrates are industrially relevant for several electronic applications, such as III-V based multi-junction solar cells grown by metal organic vapor phase epitaxy (MOVPE) [1]. A suitable Ge(100) surface preparation prior to heteroepitaxy is an important requirement for achieving low defect densities in the grown III-V epilayers, which directly affects device quality.…”
Section: Introductionmentioning
confidence: 99%
“…Ge(100) substrates are industrially relevant for several electronic applications, such as III-V based multi-junction solar cells grown by metal organic vapor phase epitaxy (MOVPE) [1]. A suitable Ge(100) surface preparation prior to heteroepitaxy is an important requirement for achieving low defect densities in the grown III-V epilayers, which directly affects device quality.…”
Section: Introductionmentioning
confidence: 99%
“…В патенте [3] предлагается использование кристаллов германия n-типа проводимости в качестве линз для инфракрасного диа-пазона длин волн. В настоящее время германий, легиро-ванный Sb, является основным материалом, служащим оптической средой в разнообразных приборах в инфра-красной области спектра от 3 до 12 мкм [4,5]. Данный материал с удельным электрическим сопротивлением от 3 до 40 Ом · см и плотностью дислокаций < 10 4 см −2 обладает высокой прозрачностью при комнатной тем-пературе, которая вблизи края полосы пропускания на длине волны 10.6 мкм изменяется в интервале от 46.1 до 45.2% в зависимости от величины удельного сопротивления кристалла.…”
Section: Introductionunclassified
“…In photovoltaics germanium is used as a substrate material for solar cells GaInP/GaInAs/Ge type with the conversion efficiency up to ∼ 39 % [1][2][3][4][5]. It requires low impurity dislocation-free Ge-crystals since dislocations and uncontrolled impurities can cause a mismatch between the lattice parameters of germanium and A B compounds, impeding the growth of high-quality epitaxial layers on germanium [1,[3][4].…”
Section: Introductionmentioning
confidence: 99%