Gold nanoparticles by soft UV nanoimprint lithography coupled to a lift-off process for plasmonic sensing of antibodies

RETRACTED: Plasmonic Nanostructures Prepared by Soft UV Nanoimprint Lithography and Their Application in Biological Sensing

“…Firstly, a thin hard layer PDMS (50 μm) was spin-coated on a Si master mold [14] that was previously treated with a trimethylchlorosilane (TMCS) anti-sticking layer. Secondly, a standard PDMS (RTV 615) layer (1.5 mm) was obtained by casting on top of the H-PDMS layer.…”

Sub-30 nm Plasmonic Nanostructures by Soft UV Nanoimprint Lithography

“…Next, the patterns designed in PMMA are transferred into the silicon substrate via a suitable RIE process. The RIE conditions are: 10 sccm for O 2 , 45 sccm for SF 6 with P = 30 W, a pressure of 50 mTorr and an autopolarization voltage of 85V [15,17]. Then, the PMMA mask is removed with a lift-off process in trichloroethylene at 80 • C. Next, the Si master mold surface is treated with HF and H 2 O 2 in order to obtain a SiO 2 thin surface layer, then modified with an anti-sticking layer (TMCS: TriMethylChloroSilane) for decreasing the surface energy (Si+TMCS = 28.9 mN/m) in order to easy remove the PDMS molds [17,19,20].…”

“…For the removal of the PMMA A2, the gas used for RIE is O 2 . A good selectivity between PMMA and AMONIL is obtained [15,17]. The next step is to evaporate a gold thin layer (30 nm) in order to realize the plasmonic nanodisks.…”

“…The replication of the flexible stamps is typically obtained by molding and curing a polymer from a 3D template. The UV transparent flexible stamp fabrication is mainly realized with poly(dimethylsiloxane) PDMS [16][17][18]. PDMS offers a good chemical stability and a high optical transparency.…”

Soft UV Nanoimprint Lithography: A Tool to Design Plasmonic Nanobiosensors

“…Next, the patterns designed in PMMA are transferred into the silicon master via a suitable RIE process. The conditions of RIE process are: 10 sccm for O 2 , 45 sccm for SF 6 with P = 30 W, a pressure of 50 mTorr and an autopolarization voltage of 85 V (Hamouda et al, 2009;Barbillon et al, 2010). Then, the PMMA mask is removed with acetone.…”