Graphite-like carbon films by high power impulse magnetron sputtering

Huang, Mengjun; Zhang, Xueqian; Ke, Peiling; Wang, Aiying

doi:10.1016/j.apsusc.2013.06.109

Cited by 75 publications

(34 citation statements)

References 31 publications

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“…High power impulse magnetron sputtering (HIPIMS) is a magnetron http://dx.doi.org/10.1016/j.apsusc.2015.01.057 0169-4332/© 2015 Elsevier B.V. All rights reserved. sputtering method developed in recent years [15], which exerts a pulsed and high power on targets [16]. HIPIMS could provide denser Ti interlayer than traditional magnetron deposition, due to the high sputtering particle ionization rate which is 2-3 orders of magnitude higher than that of conventional magnetron sputtering [17][18][19].…”

Section: Introductionmentioning

confidence: 99%

Amorphous self-lubricant MoS2-C sputtered coating with high hardness

Zou

et al. 2015

Applied Surface Science

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Section: Introductionmentioning

confidence: 99%

Amorphous self-lubricant MoS2-C sputtered coating with high hardness

Zou

et al. 2015

Applied Surface Science

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“…At low discharge voltage, the incoming sputtered carbon ions or atoms do not have enough energy to form sp 3 bonds, rather graphitization occurs. However, in our case at higher peak discharge voltage ([ 1000 V), the high energy ion bombardment of the growing films damages the sp 3 sites and thus facilitates to form sp 2 hybridization through the conversion of sp 3 bonds [30,57,58]. Furthermore, graphitization in the a-CN X coating can also be realized by the presence of high percentage (33.33% in partial pressure) of N 2 gas in the deposition process.…”

Section: Materials Characterization Resultsmentioning

confidence: 95%

“…Wang et al [29] demonstrated that during GLC amorphous films deposition by unbalanced magnetron sputtering process hardness and internal stress of the film increase with increasing duty cycle. Huang et al [30] reported that the internal stress of the graphite-like carbon films increases with increasing HiPIMS cathode voltage. In their case, the highest internal stress value was found to be 2.5 GPa at the -1000 V of HiPIMS cathode voltage.…”

Section: State Of the Art Of A-cn X Materialsmentioning

confidence: 99%

Manufacturing and Characterization of a Carbon-Based Amorphous (a-CNX) Coating Material

Rashid

Archenti

2018

Nanomanuf Metrol

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A thick 400-micron amorphous carbon nitride (a-CN X ) coating material was synthesized by means of plasma-enhanced chemical vapor deposition process. High-power impulse magnetron sputtering technique was used to sputter a pure graphite target plate in reactive argon (Ar), nitrogen (N 2 ) and acetylene (C 2 H 2 ) environment for depositing the composite coating. Structural and chemical/elemental composition of the a-CN X composite material was investigated by field emission scanning electron microscopy, energy-dispersive X-ray spectroscopy and micro-Raman spectroscopy. The rootmean-square surface roughness (S q ) and structure were estimated by atomic force microscopy. Mechanical properties such as hardness and Young's modulus (Oliver-Pharr method) at room temperature were characterized by Vickers microindentation test. Operational temperature test of the deposited a-CN X coating reveals that it can withstand up to 400°C without cracking. An inverted shaker test, based on central impedance method, was adopted to investigate the dynamic damping property of the coating material, and it was found that the first bending mode damping lossfactor of the reported a-CN X coating is 0.015 ± 0.001 and corresponding loss modulus (Young's modulus multiplied by lossfactor) is 0.234 ± 0.011 GPa.

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“…Up until now, few studies address synthesis of amorphous thin films using HIPIMS. Most of them concern C-based thin films: graphite-like-carbon (GLC) [17,18], diamondlike-carbon (DLC) [19], CN x [20], CF x [21], and SiCN [22], but also magnetic multicomponent soft magnetic FINEMET-type alloys have been studied [23,24], as well as amorphous oxide thin films including TiO 2 [25], Al 2 O 3 [26], and transparent conductive oxides (TCO) [27].…”

Section: Introductionmentioning

confidence: 99%

Growth and properties of amorphous Ti–B–Si–N thin films deposited by hybrid HIPIMS/DC-magnetron co-sputtering from TiB2 and Si targets

Fager

Greczyński

Jensen

et al. 2014

Surface and Coatings Technology

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Amorphous nitrides are explored for their homogenous structure and potential use as wear-resistant coatings, beyond their much studied nano-and microcrystalline counterparts. (TiB 2 ) 1−x Si x N thin films were deposited on Si (001) substrates by a hybrid technique of high power impulse magnetron sputtering (HIPIMS) combined with dc magnetron sputtering (DCMS) using TiB 2 and Si targets in a N 2 /Ar atmosphere. By varying the sputtering dc power to the Si target from 200 to 2000 W while keeping the average power to the TiB 2 -target, operated in HIPIMS mode, constant at 4000 W, the Si content in the films increased gradually from x=0.01 to x=0.43. The influence of the Si content on the microstructure, phase constituents, and mechanical properties were systematically investigated. The results show that the microstructure of as-deposited (TiB 2 ) 1−x Si x N films changes from nanocrystalline with 2-4 nm TiN grains for x=0.01 to fully electron diffraction amorphous for x=0.22. With increasing Si content, the hardness of the films increases from 8.5 GPa with x=0.01 to 17.2 GPa with x=0.43.

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Graphite-like carbon films by high power impulse magnetron sputtering

Cited by 75 publications

References 31 publications

Amorphous self-lubricant MoS2-C sputtered coating with high hardness

Amorphous self-lubricant MoS2-C sputtered coating with high hardness

Manufacturing and Characterization of a Carbon-Based Amorphous (a-CNX) Coating Material

Growth and properties of amorphous Ti–B–Si–N thin films deposited by hybrid HIPIMS/DC-magnetron co-sputtering from TiB2 and Si targets

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