1995
DOI: 10.1016/0022-0248(94)00527-3
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Growth behavior on V-grooved high Miller index GaAs substrates by metalorganic chemical vapor deposition

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Cited by 10 publications
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“…The signal intensity of the TEM transmission image is inversely promotional to the atomic number; therefore, the bright cone shape represents the air voids that are encapsulated by a p-Al 0.45 GaAs regrown layer shown in a light gray color, as indicated in the TEM picture as well as other features. The p-GaAs PC layer retained its steepness from the TEM image, which indicated a minute surface reconstruction induced by the in situ annealing. , Here, it is worth noting that the diameter of air holes appeared to be different owing to the sampling for TEM observation since the location of air voids is invisible from the surface of the regrown wafer. The air voids coalesced at the center of the hole shape of around 100 nm over the top surface of the p-GaAs layer for all samples in spite of the surface morphologies.…”
Section: Resultsmentioning
confidence: 93%
“…The signal intensity of the TEM transmission image is inversely promotional to the atomic number; therefore, the bright cone shape represents the air voids that are encapsulated by a p-Al 0.45 GaAs regrown layer shown in a light gray color, as indicated in the TEM picture as well as other features. The p-GaAs PC layer retained its steepness from the TEM image, which indicated a minute surface reconstruction induced by the in situ annealing. , Here, it is worth noting that the diameter of air holes appeared to be different owing to the sampling for TEM observation since the location of air voids is invisible from the surface of the regrown wafer. The air voids coalesced at the center of the hole shape of around 100 nm over the top surface of the p-GaAs layer for all samples in spite of the surface morphologies.…”
Section: Resultsmentioning
confidence: 93%