Growth of multiwall carbon nanotubes in an inductively coupled plasma reactor

Delzeit, Lance; McAninch, Ian M.; Cruden, Brett A.; Hash, David; Chen, Bin; Han, Jie; Meyyappan, M.

doi:10.1063/1.1465101

Cited by 213 publications

(164 citation statements)

References 24 publications

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“…Delzeit et al 6 grew CNFs using a CH 4 /H 2 inductively coupled plasma across a pressure range of 0.5-20 Torr, and reported that the number density of CNFs obtained below 1 Torr was low and that amorphous carbon was deposited at high pressures. These tendencies for pres- sure dependence, i.e., the CNT orientation and production of amorphous carbon, were also observed in the present experiments with CH 4 .…”

Section: Resultsmentioning

confidence: 99%

“…[6][7][8][9][10][11] OES has an advantage in its spatial resolution of the measurements, while mass spectrometry can detect even nonradiative species of high molecular weight. Plasma modeling is suitable for analysis of the overall behavior of plasma species.…”

Section: Introductionmentioning

confidence: 99%

“…Denysenko et al 10 analyzed an inductively coupled Ar/ CH 4 /H 2 plasma for PECVD of vertically aligned carbon nanostructures using quadrupole mass spectrometry and OES, and compared the results of the number densities of neutrals and ions with estimations by a zero-dimensional rate equation. Delzeit et al 6 used a zero-dimensional model to characterize CH 4 /H 2 plasmas for CNT growth and suggested enhancement in CH 4 dissociation by collision of H atoms. Hash et al 8 performed onedimensional simulations of dc C 2 H 2 /NH 3 / Ar plasmas for CNT production.…”

Section: Introductionmentioning

confidence: 99%

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Predicting the amount of carbon in carbon nanotubes grown by CH4 rf plasmas

Okita

Suda

Ozeki

et al. 2006

Journal of Applied Physics

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Carbon nanotubes ͑CNTs͒ were grown on Si substrates by rf CH 4 plasma-enhanced chemical vapor deposition in a pressure range of 1 -10 Torr, and then characterized by scanning electron microscopy. At 1 Torr, the CNTs continued growing up to 60 min, while their height at 4 Torr had leveled off at 20 min. CNTs hardly grew at 10 Torr and amorphous carbon was deposited instead. CH 4 plasma was simulated using a one-dimensional fluid model to evaluate the production and transport of radicals, ions, and nonradical neutrals. The amount of simulated carbon supplied to the electrode surface via the flux of radicals and ions such as CH 3 , C 2 H 5 , and C 2 H 5 + was consistent with estimations from experimental results.

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Section: Resultsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Predicting the amount of carbon in carbon nanotubes grown by CH4 rf plasmas

Okita

Suda

Ozeki

et al. 2006

Journal of Applied Physics

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“…In addition, the TCP reactor has an independent RF power supply to the substrate which can be useful in the growth of nanotubes in vertical alignment. Second, some experimental effort has been explored on synthesizing nanotubes in such system in the past decades [17][18][19]. These experimental data can be used to validate our simulation results.…”

Section: Introductionmentioning

confidence: 93%

Investigating the plasma chemistry for the synthesis of carbon nanotubes/nanofibres in an inductively coupled plasma enhanced CVD system: the effect of different gas mixtures

Mao¹,

Bogaerts²

2010

J. Phys. D: Appl. Phys.

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To cite this version:M Mao, A Bogaerts. Investigating the plasma chemistry for the synthesis of carbon nanotubes/nanofibres in an inductively coupled plasma enhanced CVD system: the effect of different gas mixtures. Journal of Physics D: Applied Physics, IOP Publishing, 2010, 43 (20) Abstract. A hybrid model, called the Hybrid Plasma Equipment Model (HPEM) was used to study an inductively coupled plasma in gas mixtures of H 2 or NH 3 with CH 4 or C 2 H 2 used for the synthesis of carbon nanotubes or carbon nanofibers (CNTs/CNFs). The plasma properties are discussed for the different gas mixture at low and moderate pressure, and the growth precursors for CNTs/CNFs are analyzed. It is found that C 2 H 2 , C 2 H 4 , and C 2 H 6 are the predominant molecules in CH 4 containing plasmas beside the feedstock gas, and serve as carbon sources for CNT/CNF formation. On the other hand, long chain hydrocarbons are observed in C 2 H 2 containing plasmas. Furthermore, the background gases CH 4 and C 2 H 2 show a different decomposition rate with H 2 or NH 3 addition at moderate pressures.

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“…The vertical alignment of the fibers is a result of the electric field in the plasma. 11 Although other plasma sources such as hot-filament dc (HF-dc PECVD), 79 magnetron-type radio frequency (rf-PECVD), 80,81 inductively coupled plasma (ICP PECVD), 82 and microwave (M-PECVD) 83 have also been used to grow carbon nanotubes and aligned nanofibers, dc PECVD has produced the best results. 11 The VACNF growth recipe depends on the properties of the reactor being used and the choice of catalyst and underlayer materials.…”

Section: A Comblike Varactormentioning

confidence: 99%

Vertically aligned carbon based varactors

Ghavanini

Enoksson

Bengtsson

et al. 2011

Journal of Applied Physics

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This paper gives an assessment of vertically aligned carbon based varactors and validates their potential for future applications. The varactors discussed here are nanoelectromechanical devices which are based on either vertically aligned carbon nanofibers or vertically aligned carbon nanotube arrays. A generic analytical model for parallel plate nanoelectromechanical varactors based on previous works is developed and is used to formulate a universal expression for their voltage-capacitance relation. Specific expressions for the nanofiber based and the nanotube based varactors are then derived separately from the generic model. This paper also provides a detailed review on the fabrication of carbon based varactors and pays special attention to the challenges in realizing such devices. Finally, the performance of the carbon based varactor is assessed in accordance with four criteria: the static capacitance, the tuning ratio, the quality factor, and the operating voltage. Although the reported performance is still far inferior to other varactor technologies, our prognosis which stems from the analytical model shows a promise of a high quality factor as well as a potential for high power handling for carbon based varactors.

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Growth of multiwall carbon nanotubes in an inductively coupled plasma reactor

Cited by 213 publications

References 24 publications

Predicting the amount of carbon in carbon nanotubes grown by CH4 rf plasmas

Predicting the amount of carbon in carbon nanotubes grown by CH4 rf plasmas

Investigating the plasma chemistry for the synthesis of carbon nanotubes/nanofibres in an inductively coupled plasma enhanced CVD system: the effect of different gas mixtures

Vertically aligned carbon based varactors

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