Growth of ZrC thin films by aerosol-assisted MOCVD

Won, Yong Sun; Kim, Young Seok; Varanasi, Venu; Kryliouk, O.; Anderson, Timothy J.; Sirimanne, Chatu T.; McElwee‐White, Lisa

doi:10.1016/j.jcrysgro.2006.12.071

Cited by 46 publications

(25 citation statements)

References 38 publications

Supporting

Mentioning

Contrasting

Unclassified

Order By: Relevance

“…The C 1 s region for ZrO 2 nanotubes is shown in Fig. 9c without evidence attributes to ZrC in the C 1 s region (C 1 s, 282 eV) [42], which indicates that C is a contamination induced from the nonaqueous electrolyte or during storage of the sample in air [43]. On the other hand, the F 1 s peak at 685.5 eV, as shown in Fig.…”

Section: Resultsmentioning

confidence: 91%

Fabrication parameter-dependent morphologies of self-organized ZrO2 nanotubes during anodization

Dong

Luo

et al. 2011

J Solid State Electrochem

View full text Add to dashboard Cite

Zirconia (ZrO 2 ) nanotubes have been synthesized using a facile anodizing process in organic electrolyte systems containing a low content of fluoride. The nanotube architecture evolution was recorded at different anodization periods (1-24 h) by scanning electron microscopy. A compact layer was found between the Zr substrate and its upper tubular layer after 1 h of anodization, whereas after further anodization for 3 h the compact layer disappeared. Meanwhile, ZrO 2 nanotubes turned to a uniform structure from top to bottom. However, after 18-24-h-long anodization, the uniform tubular layer was replaced by a random layer composed of various structural defects. Since the compact layer was not completely dissolved, the retained compact layer yielded O-rings with double walls on the outer surface of the nanotubes.

show abstract

Section: Resultsmentioning

confidence: 91%

Fabrication parameter-dependent morphologies of self-organized ZrO2 nanotubes during anodization

Dong

Luo

et al. 2011

J Solid State Electrochem

View full text Add to dashboard Cite

show abstract

Section: Introductionmentioning

confidence: 99%

“…There are many recent reports describing the deposition of ZrC films by a variety of physical vapor deposition (PVD) or chemical vapor deposition (CVD) based techniques [5][6][7][8][9]. It appears that is rather difficult to obtain high quality ZrC films, because the same properties that make ZrC very attractive for applications, such as high melting point (T m = 3445 8C), low sputtering or evaporation rates, together with Zr high affinity for oxygen [5,7,10,11] are rendering the deposition of thin films difficult. The pulsed laser deposition (PLD) technique, which is known to allow for a decrease of the deposition temperature with respect to other techniques while preserving the high quality of the grown films [12,13], has been successfully employed to deposit ZrC films [14][15][16][17][18].…”

Section: Introductionmentioning

confidence: 99%

Chemical composition of ZrC thin films grown by pulsed laser deposition

Crǎciun

Socol

Stefan

et al. 2009

Applied Surface Science

View full text Add to dashboard Cite

“…Precursor solutions were subjected to ultrasonic nebulization, which resulted in small droplets with controlled size [19]. The feed rate of the solution was 4 mL/h (0.067 sccm) and the total amount of solution was 10 mL [20]. Hydrogen (99.999% purity) was used as carrier gas [20].…”

Section: Methodsmentioning

confidence: 99%

“…The feed rate of the solution was 4 mL/h (0.067 sccm) and the total amount of solution was 10 mL [20]. Hydrogen (99.999% purity) was used as carrier gas [20].…”

Section: Methodsmentioning

confidence: 99%