The structural and magnetic properties of p-GaN implanted with high doses of Mn + or Fe + (0.1-5 at%) and subsequently annealed at 700-1000 C were examined by transmission electron microscopy, selected-area diffraction patterns, X-ray diffraction and SQUID magnetometry. The implanted samples showed paramagnetic behavior on a large diamagnetic background signal for implantation doses below 3 at% Mn or Fe. At higher doses the samples showed signatures of ferromagnetism with Curie temperatures < 250 K for Mn and < 150 K for Fe implantation. The structural analysis of the Mn-implanted GaN showed regions consistent with the formation of Ga x Mn 1--x N platelets occupying $5% of the implanted volume. An estimate of $(5.5 AE 1.9) m B per Mn was obtained, consistent with the expected value (5.0) for a half-filled shell. The formation of secondary phases such as Mn x Ga y or Mn x N y was excluded by careful diffraction analysis. The implantation process may have application in forming selected-area contact regions for spinpolarized carrier injection in device structures and in enabling a quick determination of the Curie temperatures in dilute magnetic semiconductor host materials.