2007
DOI: 10.1016/j.jcrysgro.2007.04.042
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Heavily nitrogen-doped 4H-SiC homoepitaxial films grown on porous SiC substrates

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Cited by 8 publications
(4 citation statements)
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“…As a result, off-axis SI 4H-SiC are more expensive than on-axis material. Therefore, epitaxial growth on costly off-axis SI 4H-SiC substrate should offer improvements not only morphologically but also in terms of hitting the require doping level of 10 20 cm -3 [41]. To realize an all-SiC antenna, this approach would yield the best performance due to the high quality and heavily doped antenna electrode layer.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…As a result, off-axis SI 4H-SiC are more expensive than on-axis material. Therefore, epitaxial growth on costly off-axis SI 4H-SiC substrate should offer improvements not only morphologically but also in terms of hitting the require doping level of 10 20 cm -3 [41]. To realize an all-SiC antenna, this approach would yield the best performance due to the high quality and heavily doped antenna electrode layer.…”
Section: Resultsmentioning
confidence: 99%
“…It is proposed in future work that a costly off-axis SI 4H-SiC substrate could offer improvements for this structure option. In fact there is no reason, based on the literature where doping levels of 10 20 cm -3 are routinely achieved during the growth of 4H-SiC [41]. And due to the high quality of the doped layer this approach to realizing the antenna should yield the best performance.…”
Section: Chemical Vapor Deposition (Cvd) Growthmentioning
confidence: 99%
“…Different types of 4H-SiC based power devices had different requirements on the conduction type and doping concentration of epitaxial films [154,155]. Doping was a key technique to change the conduction type and carrier concentration of semiconductor materials.…”
Section: Doping Of 4h-sic Epitaxial Filmsmentioning
confidence: 99%
“…Recently, the demand for more powerful and sophisticated device applications has led to studies on the fabrication of compound semiconductors on porous substrates. The most outstanding advantage of porous semiconductors for substrate applications is that the nanopatterned porous structures can act as a sink to accommodate the strain and threading dislocations in order to obtain the subsequent layer with lower strain and dislocation densities [1].…”
Section: Introductionmentioning
confidence: 99%