2014
DOI: 10.1116/1.4863676
|View full text |Cite
|
Sign up to set email alerts
|

Helium ion microscopy

Abstract: Helium ion microcopy based on gas field ion sources represents a new ultrahigh resolution microscopy and nanofabrication technique. It is an enabling technology that not only provides imagery of conducting as well as uncoated insulating nanostructures but also allows to create these features. The latter can be achieved using resists or material removal due to sputtering. The close to free-form sculpting of structures over several length scales has been made possible by the extension of the method to other gase… Show more

Help me understand this report
View preprint versions

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

3
159
0

Year Published

2016
2016
2019
2019

Publication Types

Select...
5
4

Relationship

1
8

Authors

Journals

citations
Cited by 213 publications
(162 citation statements)
references
References 141 publications
(154 reference statements)
3
159
0
Order By: Relevance
“…In Flame1.75, the soot concentration was very low and the sampling was taken at 12 mm only. The collected samples were analyzed by a helium-ion microscope (Carl Zeiss Orion Plus) (Hlawacek and G€ olzh€ auser 2016). This microscope focuses helium ions onto the specimen and scans the beam over the sample.…”
Section: Himmentioning
confidence: 99%
“…In Flame1.75, the soot concentration was very low and the sampling was taken at 12 mm only. The collected samples were analyzed by a helium-ion microscope (Carl Zeiss Orion Plus) (Hlawacek and G€ olzh€ auser 2016). This microscope focuses helium ions onto the specimen and scans the beam over the sample.…”
Section: Himmentioning
confidence: 99%
“…The in-house research is focused on the development of new analytical methods, instrumentation for in-situ experiments and the investigation of new ion sources (Bischo et al, 2016). Furthermore, these methods and procedures are used to investigate a wide range of ion material interactions in the fundamental as well as applied part of materials research (Hlawacek et al, 2014;Philipp & Bischo , 2012). Recent projects include the fabrication of arbitrary sized nano-magnets using low-uence focused Ne + ion irradiation.…”
Section: Focused Ion Beam Techniquesmentioning
confidence: 99%
“…At beam energies of 35 keV helium ions do not lead to the emission of characteristic X-rays from a sample. While some compositional information can be obtained from back scattered helium [2], identifying elemental information is more difficult due to the multiple collisions that occur at energies below 100 keV [3].…”
mentioning
confidence: 99%
“…At beam energies of 35 keV helium ions do not lead to the emission of characteristic X-rays from a sample. While some compositional information can be obtained from back scattered helium [2], identifying elemental information is more difficult due to the multiple collisions that occur at energies below 100 keV [3].In this paper we present the latest results from a prototype Secondary Ion Mass Spectrometry (SIMS) system specifically designed for the Zeiss ORION NanoFab HIM [4][5][6]. As the probe size of the HIM is below the lateral information limit in SIMS, the lateral resolution is only limited by the probe-sample interactions and not (as in commercial SIMS instruments) the probe size.…”
mentioning
confidence: 99%