Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE
DOI: 10.1109/imnc.2000.872601
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High accurate optical proximity correction under the influences of lens aberration in 0.15 μm logic process

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Cited by 5 publications
(2 citation statements)
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“…The distortions in optical lithography include corner rounding, pulling back at the end of the narrow line, and the wide variation of line widths. To compensate for the distortion or cancel out the interference from the neighboring light diffractions, two techniques-OPC [12,13,33] and Phase Shift Masking (PSM) [6,7,24,30] have been demonstrated to show significant improvements in sub-wavelength lithography technology. OPC works by adding or subtracting some features as serifs or line segments while PSM operates by changing the phase of the transmitted light through certain regions on the mask.…”
Section: Opc Technologiesmentioning
confidence: 99%
“…The distortions in optical lithography include corner rounding, pulling back at the end of the narrow line, and the wide variation of line widths. To compensate for the distortion or cancel out the interference from the neighboring light diffractions, two techniques-OPC [12,13,33] and Phase Shift Masking (PSM) [6,7,24,30] have been demonstrated to show significant improvements in sub-wavelength lithography technology. OPC works by adding or subtracting some features as serifs or line segments while PSM operates by changing the phase of the transmitted light through certain regions on the mask.…”
Section: Opc Technologiesmentioning
confidence: 99%
“…The distortions in optical lithography include corner rounding, pulling back at the end of the narrow line, and the wide variation of line widths. To compensate for the distortion or cancel out the interference from the neighboring light diffractions, two techniques-OPC [12,13,33] and Phase Shift Masking (PSM) [6,7,24,30] have been demonstrated to show significant improvements in sub-wavelength lithography technology. OPC works by adding or subtracting some features as serifs or line segments while PSM operates by changing the phase of the transmitted light through certain regions on the mask.…”
Section: Opc Technologiesmentioning
confidence: 99%