2006
DOI: 10.1109/lpt.2006.875063
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High efficiency and improved ESD characteristics of GaN-based LEDs with naturally textured surface grown by MOCVD

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Cited by 68 publications
(17 citation statements)
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“…Using Antiparallel Ga-and N-Polar Domains in p-GaN Layer [7], [8]; varying the p-GaN layer growth temperature [6]; developing modulation-doped AlGaN-GaN superlattice structures [9]; and varying the internal-capacitance structure of the LED [10]. We are unaware, however, of any reports describing the relationship between the p-layer polarity and the ESD properties of nitride-based LEDs.…”
Section: Improvement Of Esd Level Of Gan-based Ledsmentioning
confidence: 99%
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“…Using Antiparallel Ga-and N-Polar Domains in p-GaN Layer [7], [8]; varying the p-GaN layer growth temperature [6]; developing modulation-doped AlGaN-GaN superlattice structures [9]; and varying the internal-capacitance structure of the LED [10]. We are unaware, however, of any reports describing the relationship between the p-layer polarity and the ESD properties of nitride-based LEDs.…”
Section: Improvement Of Esd Level Of Gan-based Ledsmentioning
confidence: 99%
“…One possibility is the relaxation of the strain. The relatively low growth temperature (840 • C) and heavy Si doping concentration (1 × 10 19 atoms cm −3 ) of the underlying space layer enhance the formation of V-shaped pits, which can be attributed to the small diffusion length of the Ga atom that hinders its migration to the proper location at low temperature [7]. A high-resolution X-ray diffraction θ/2θ scan did reveal a larger Bragg angle θ position (17.373 • ) shifting to the higher angle side for sample B, compared with that for sample A (17.346 • ), indicating that a larger tensile stress prevails in sample B [19].…”
Section: Improvement Of Esd Level Of Gan-based Ledsmentioning
confidence: 99%
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“…Moreover, few studies have proposed anti-ESD strategies for photoelectric components, in particular, GaN-based LEDs. Studies on GaN-based LEDs have recommended establishing and incorporating a parallel protection diode [20]- [23], Schottky diode [24], [25], extra capacitor [26]- [28], n or undoped GaN layers [29]- [32], textured p-GaN layers [33]- [35], super-lattice structures [36]- [39], floating metal rings [40], bottom metal air-gap structures [41], or additional CMOS protection circuits [42]. However, these strategies involve additional layers and increased costs.…”
Section: Introductionmentioning
confidence: 99%
“…To form surface texture pattern, several techniques are applied, such as anisotropic photoelectrochemical etching process (Fujii et al 2004), natural lithography (Yang et al 2005). These techniques make LED surface roughened in shape of trapezia (Han et al 2006), pyramid (Fujii et al 2004) and V-shaped (Tsai et al 2006), Surface roughness is critical and must be controlled by about one-half wavelength according to (Yang et al 2005). The dimension of a single texture unit varies near LED peak wavelength (Windisch et al 1999).…”
mentioning
confidence: 99%