Electrostatic discharge (ESD) endurance ability of InGaN blue light-emitting diodes is significantly improved when antiparallel Ga-and N-polar domains coexist within the p-type GaN-layer region. The inversion of Ga to N polarity in this region, which is verified using convergent-beam electron diffraction, was induced by the stress accumulated in the underlying layers. A typical p-type GaN layer, which is composed of a periodical arrangement of Ga-polar domains (width, 450 nm) and antiparallel Ga-and N-polar domains (width, 150 nm), improves the negative human-body mode ESD 4000 V pass yields to greater than 90%.Index Terms-Antiparallel domain, electrostatic discharge (ESD), InGaN light-emitting diode (LED), p-type GaN layer. N ITRIDES are semiconductors possessing wide and direct energy gaps. They have attracted much interest as materials for use in short-wavelength optoelectronic and high-temperature electronic applications, such as visible lightemitting diodes (LEDs), laser diodes, and photodetectors. Because nitride-based LEDs are applied in traffic signals, backlight units, and general lighting, their reliability is an important issue. In particular, the electrostatic discharge (ESD) stress, which induces latent damage or sudden failure in LED devices, is now one of the most important product specifications of LEDs. The high density of inherent threading dislocations in GaN-based layers grown on lattice-mismatched and insulating sapphire substrates makes these LEDs susceptible to the generation of poor ESD properties during the device encapsulation process. Several attempts have been made to improve the ESD properties of GaN-based LEDs, including combining the LEDs with internal Schottky diodes [1], internal protection diodes [2], [3], or a metal-oxide-semiconductor capacitor [4]; inserting a floating metal ring in the LEDs [5]; employing a device bonding-pad design [6] or thicker p-GaN or p-AlGaN layers Manuscript [7], [8]; varying the p-GaN layer growth temperature [6]; developing modulation-doped AlGaN-GaN superlattice structures [9]; and varying the internal-capacitance structure of the LED [10]. We are unaware, however, of any reports describing the relationship between the p-layer polarity and the ESD properties of nitride-based LEDs.In this letter, we achieved a significant improvement in the ESD properties of an LED through the growth of an elaborate bundle of antiparallel Ga-and N-polar domains within the p-type GaN layer region. We have also developed a plausible model to explain this improvement in the ESD properties.The epitaxial layers of the InGaN LED were grown on (0001) patterned sapphire substrates in a vertical close-coupled showerhead rotating-disk reactor (Thomas Swan Scientific Equipment, Cambridge, U.K.). A 30-nm-thick buffer layer was grown at 550 • C, and then, a 1.5-μm-thick undoped GaN layer, a 5-μm-thick Si-doped GaN n-type layer, and a 10-nm-thick n-type AlGaN cladding layer were grown at 1040 • C. Next, a 260-(sample A) or 460-nm-thick (sample B) heavily Si-doped GaN space layer ...