2015
DOI: 10.1109/led.2014.2379664
|View full text |Cite
|
Sign up to set email alerts
|

High-Frequency Performance of GaN High-Electron Mobility Transistors on 3C-SiC/Si Substrates With Au-Free Ohmic Contacts

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1

Citation Types

1
20
0

Year Published

2015
2015
2024
2024

Publication Types

Select...
6
1
1

Relationship

1
7

Authors

Journals

citations
Cited by 51 publications
(21 citation statements)
references
References 28 publications
1
20
0
Order By: Relevance
“…In addition to present lower resistance (R ). Some comparisons between different materials are reported in [33] regarding this point, of which the comparison among the 3 materials mentioned above is presented in Fig. 2.…”
Section: Physical Properties and Performance Of Si Sic Y Ganmentioning
confidence: 99%
“…In addition to present lower resistance (R ). Some comparisons between different materials are reported in [33] regarding this point, of which the comparison among the 3 materials mentioned above is presented in Fig. 2.…”
Section: Physical Properties and Performance Of Si Sic Y Ganmentioning
confidence: 99%
“…Another application for the GaN-on-Si product is lower switching voltage (600 V and lower) power electronics. 19 However, improving the starting material quality and yield, increasing the wafer diameter, reducing wafer cost, and developing normally OFF devices are needed in order to compete with the current state-of-the-art Si devices.…”
Section: Applications and Fi Gures Of Meritmentioning
confidence: 99%
“…While the first determines the tensile stress in the AlN film , the second may relate to electrical leakage via screw dislocations or for instance, via the diffusion of Ga through the thinner AlN in the V‐pits, justifying the attempts to grow low strained and smooth AlN layers . One alternative for enabling the nucleation of AlN at high temperature is to intercalate another material like 3C‐SiC .…”
Section: Buffer Layer Schemes On Siliconmentioning
confidence: 99%