2015
DOI: 10.1021/acs.nanolett.5b00668
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High-Performance WSe2 Complementary Metal Oxide Semiconductor Technology and Integrated Circuits

Abstract: Due to their extraordinary structural and electrical properties, two dimensional materials are currently being pursued for applications such as thin-film transistors and integrated circuit. One of the main challenges that still needs to be overcome for these applications is the fabrication of air-stable transistors with industry-compatible complementary metal oxide semiconductor (CMOS) technology. In this work, we experimentally demonstrate a novel high performance air-stable WSe 2 CMOS technology with almost … Show more

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Cited by 213 publications
(222 citation statements)
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“…Besides MoS2, other TMDs have been also considered for FETs' fabrication. As an example, WSe2 is a slightly p-doped semiconductor, allowing the fabrication of both p-type and n-type FETs by proper selection of the metal contacts [66][67][68]. However, the problem of the contact resistance still holds also in the case of WSe2.…”
Section: Introductionmentioning
confidence: 99%
“…Besides MoS2, other TMDs have been also considered for FETs' fabrication. As an example, WSe2 is a slightly p-doped semiconductor, allowing the fabrication of both p-type and n-type FETs by proper selection of the metal contacts [66][67][68]. However, the problem of the contact resistance still holds also in the case of WSe2.…”
Section: Introductionmentioning
confidence: 99%
“…High-performance ambipolar WSe 2 -FETs have already been reported using dissimilar low and high work function metal contacts to obtain low-resistance, ohmic contacts to electrons and holes, respectively. 7,24 Figure 1b plots the transfer characteristics of a MoS 2 /WSe 2 hetero-FET arranged in the in-series mode. In this configuration, the MoS 2 and WSe 2 films form an overlapped region so that the source and drain electrodes (S/D) are in contact with the films, while leaving the overlapped region away from direct contact with the electrodes.…”
mentioning
confidence: 99%
“…Wang et al fabricated 2-12 transistors in one circuit to offer a group of functions, such as inverter, static random access memory, etc. CMOS circuits are demonstrated by Yu et al in WSe 2 with a voltage gain of about 38 and a small static dissipation [90]. Although the performance of the present devices seems good, further work still needs to be done to increase operating speeds and decrease the power dissipation for practical applications.…”
Section: Volatile Field-effect Transistor (Fet) Devicesmentioning
confidence: 81%