High Precision Alignment in Multi-Layer NanoImprint Lithography

Mühlberger, M.; Schwinger, W.; Gmainer, M.; Schöftner, Rainer; Glinsner, T.; Hasenfuß, Ch.; Hingerl, Kurt; Schmidt, Holger; Kley, E. B.

doi:10.1063/1.2730474

Cited by 3 publications

(2 citation statements)

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“…Although this special layer sequence only serves demonstrational purposes it shows the potential of preparing several nanoimprinted layers on top of each other. For nanoimprinting of optical components alignment in the range of 100nm has been shown [23][24][25] . For the sample in Figure 1 the high index material was just droplet dispensed, with the hexagon-shape developing due to the underlying micropattern, which consisted of a hexagonal array of pillars.…”

Section: Thermalmentioning

confidence: 99%

Direct patterning of functional materials using nanoimprint lithography

Haslinger,

Kopp,

Jonaityte

et al. 2023

38th European Mask and Lithography Conference (EMLC 2023)

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Section: Thermalmentioning

confidence: 99%

Direct patterning of functional materials using nanoimprint lithography

Haslinger,

Kopp,

Jonaityte

et al. 2023

38th European Mask and Lithography Conference (EMLC 2023)

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“…In order to achieve a photonic band gap the structures have to be aligned with an overlay alignment accuracy of 100 nm for the 300 nm rod width. The alignment is performed in 3 stages using Vernier and Moiré patterns resulting in overlay alignment accuracies better than 100 nm [4,5]. The 5 th layer has to be positioned exactly above the 1 st layer.…”

Section: Process Flow For the Woodpile Structurementioning

confidence: 99%

Fabrication process of 3D-photonic crystals via UV-nanoimprint lithography

et al. 2007

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In recent years the standard lithography reached its limits due to the diffraction effects encountered and the necessary complexity of compatible masks and projection optics. The restrictions on wavelength, in combination with high process and equipment costs make low cost, simple imprinting techniques competitive with next generation lithography methods. There are several Nanoimprint Lithography (NIL) techniques which can be categorized depending on the process parameters and the imprinting method -either step & repeat or full wafer imprinting. A variety of potential applications has been demonstrated using NIL (e.g. SAW devices, vias and contact layers with dual damascene imprinting process, Bragg structures, patterned media) [1,2]. In this work UV-NIL has been selected for the fabrication process of 3D-photonic crystals. Results with up to three layers will be demonstrated.

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Alignment Algorithm for Nano-scale Three-dimensional Printing System

Jang¹,

Lee²,

Kim³

et al. 2014

Journal of the Korean Society for Precision Engineering

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Hybrid manufacturing technology has been advanced to overcome limitations due to traditional fabrication methods. To fabricate a micro/nano-scale structure, various manufacturing technologies such as lithography and etching were attempted. Since these manufacturing processes are limited by their materials, temperature and features, it is necessary to develop a new three-dimensional (3D) printing method. A novel nano-scale 3D printing system was developed consisting of the Nano-Particle Deposition System (NPDS) and the Focused Ion Beam (FIB) to overcome these limitations. By repeating deposition and machining processes, it was possible to fabricate micro/nano-scale 3D structures with various metals and ceramics. Since each process works in different chambers, a transfer process is required. In this research, nanoscale 3D printing system was briefly explained and an alignment algorithm for nano-scale 3D printing system was developed. Implementing the algorithm leads to an accepted error margin of 0.5% by compensating error in rotational, horizontal, and vertical axes.

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High Precision Alignment in Multi-Layer NanoImprint Lithography

Cited by 3 publications

References 0 publications

Direct patterning of functional materials using nanoimprint lithography

Direct patterning of functional materials using nanoimprint lithography

Fabrication process of 3D-photonic crystals via UV-nanoimprint lithography

Alignment Algorithm for Nano-scale Three-dimensional Printing System

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