High-precision determination of residual stress of polycrystalline coatings using optimised XRD-sin2ψ technique

Luo, Quanshun; Jones, Alan Hywel

doi:10.1016/j.surfcoat.2010.07.108

Cited by 152 publications

(71 citation statements)

References 27 publications

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“…For the measurement, the position of a peak with specific Miller indices is measured at different tilt angles to get the change in d-spacing as a function of the tilt angle. The fundamental equation for an XRD-sin 2 ψ stress measurement can be written as 48,49 …”

Section: Experimental Apparatus and Methodsmentioning

confidence: 99%

Growth of HfN thin films by reactive high power impulse magnetron sputtering

Thorsteinsson

Guðmundsson

2018

AIP Advances

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Thin hafnium nitride films were grown on SiO2 by reactive high power impulse magnetron sputtering (HiPIMS) and reactive direct current magnetron sputtering (dcMS). The conditions during growth were kept similar and the film properties were compared as growth temperature, nitrogen flow rate, and in the case of HiPIMS, duty cycle were independently varied. The films were characterized with grazing incidence X-ray diffraction (GIXRD), X-ray reflection (XRR) and X-ray stress analysis (XSA). HiPIMS growth had a lower growth rate for all grown films, but the films surfaces were smoother. The film density of HiPIMS deposited films grown at low duty cycle was comparable to dcMS grown films. Increasing the duty cycle increased the density of the HiPIMS grown films almost to the bulk density of HfN as well as increasing the growth rate, while the surface roughness did not change significantly. The HiPIMS grown films had large compressive stress while the dcMS grown films had some tensile stress. The dcMS grown films exhibit larger grains than HiPIMS grown films. The grain size of HiPIMS grown films decreases with increasing nitrogen flow rate, while the dcMS grain size increased with increasing nitrogen flow rate. This work shows that duty cycle during HiPIMS growth of HfN films has a significant effect on the film density and growth rate while other film properties seem mostly unaffected.

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Section: Experimental Apparatus and Methodsmentioning

confidence: 99%

Growth of HfN thin films by reactive high power impulse magnetron sputtering

Thorsteinsson

Guðmundsson

2018

AIP Advances

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“…A parabolic approach technique of 0.6 I max (I max denoting the maximum intensity of a diffraction peak) was adopted to determine the diffraction angle, 2θ, as our previous research revealed that parabolic approach ensures the highest precision in peak positioning measurement [25]. Then, using each measured 2θ value, the precise values of the off-axis angle, ψ, crystal plane d-spacing, d, and lattice parameter, a, were deduced accordingly.…”

Section: Xrd Experimentsmentioning

confidence: 99%

“…In case of transition metal nitrides, a number of papers reported the anisotropic elastic modulus of titanium nitride coatings [8,[20][21][22][23][24]. For the data scattering in a linear d-sin 2 ψ plot, it has been reported that the method of diffraction peak positioning has significant influence on the precision of the linear d-sin 2 ψ regression and the parabolic method was recommended to give the lowest scattering [25].…”

Section: Introductionmentioning

confidence: 99%

Uncertainty of the X-ray Diffraction (XRD) sin2 ψ Technique in Measuring Residual Stresses of Physical Vapor Deposition (PVD) Hard Coatings

Luo

Yang

2017

Coatings

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Abstract:Residual stresses of physical vapor deposition (PVD) hard coatings can be measured using X-ray diffraction (XRD) methods under either conventional d-sin 2 ψ mode or glancing incident (GIXRD) mode, in which substantial uncertainties exist depending on the applied diffraction parameters. This paper reports systematic research on the effect of the two analytical modes, as well as the anisotropic elastic modulus, on the measured residual stress values. A magnetron sputtered TiN grown on hardened tool steel was employed as the sample coating, to measure its residual stress using various diffraction peaks from {111} to {422} acquired at a range of incident glancing angles from 2 • to 35 • . The results were interpreted in terms of the effective X-ray penetration depth, which has been found to be determined predominantly by the incident glancing angle. In the d-sin 2 ψ mode, the results present an approximate residual stress over a depth of effective X-ray penetration, and it is recommended to use a diffraction peak of high-index lattice plane from {311} to {422}. The GIXRD mode helps determine a depth profile of residual stress, since the measured residual stress depends strongly on the X-ray penetration. In addition, the anisotropy of elastic modulus shows limited influence on the calculated residual stress value.

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“…In the measurement of residual stress, the sin 2 ψ technique was employed based on slow scans of the (111) and (220) planes at step size of 0.033 0 and step time of 300 -700 seconds respectively. The diffraction peak positions were determined by the parabolic approach following our recent optimization of XRD residual stress measurement [23] . The Young's modulus and Poisson's ratio values were taken from literature to be 300 GPa and 0.23 respectively [23] .…”

Section: Characterizationmentioning

confidence: 99%

“…The diffraction peak positions were determined by the parabolic approach following our recent optimization of XRD residual stress measurement [23] . The Young's modulus and Poisson's ratio values were taken from literature to be 300 GPa and 0.23 respectively [23] . A Philips CM20 TEM was used to characterize the crosssectional structure of the deposited coatings.…”

Section: Characterizationmentioning

confidence: 99%

Hybrid HIPIMS and DC magnetron sputtering deposition of TiN coatings: Deposition rate, structure and tribological properties

Luo

Yang

Cooke

2013

Surface and Coatings Technology

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Abstract:High power impulse magnetron sputtering (HIPIMS) has the advantage of ultra-dense plasma deposition environment although the resultant deposition rate is significantly low. By using a closed field unbalanced magnetron sputtering system, a hybrid process consisting of one HIPIMS powered magnetron and three DC magnetrons has been introduced in the reactive sputtering deposition of a TiN hard coating on a hardened steel substrate, to investigate the effect of HIPIMS incorporation on the deposition rate and on the microstructure and mechanical and tribological properties of the deposited coating. Various characterizations and tests have been applied in the study, including XRD, FEG-SEM, cross-sectional TEM, Knoop hardness, adhesion tests and unlubricated ball-on-disk tribo-tests. The results revealed that, both the DC magnetron and hybrid-sputtered TiN coatings exhibited dense columnar morphology, a single NaCl-type cubic crystalline phase with strong (220) texture, and good adhesion property. The two coatings showed similar dry sliding friction coefficient of 0.8 -0.9 and comparable wear coefficient in the range of 1 -2 × 10 -15 m 3 N -1 m -1 . The overall deposition rate of the hybrid sputtering, being 0.047 µm/min as measured in this study, was governed predominantly by the three DC magnetrons whereas the HIPIMS only made a marginal contribution. However, the incorporated HIPIMS has been found to lead to remarkable reduction of the compressive residual stress from -6.0 to -3.5 GPa and a slight increase in the coating hardness from 34.8 to 38.0 GPa.

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High-precision determination of residual stress of polycrystalline coatings using optimised XRD-sin2ψ technique

Cited by 152 publications

References 27 publications

Growth of HfN thin films by reactive high power impulse magnetron sputtering

Growth of HfN thin films by reactive high power impulse magnetron sputtering

Uncertainty of the X-ray Diffraction (XRD) sin2 ψ Technique in Measuring Residual Stresses of Physical Vapor Deposition (PVD) Hard Coatings

Hybrid HIPIMS and DC magnetron sputtering deposition of TiN coatings: Deposition rate, structure and tribological properties

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