Ultraviolet photodetectors (UVPDs) have played an important
role
both in civil and military applications. While various studies have
shown that traditional UVPDs based on wide-band-gap semiconductors
(WBSs) have excellent device performances, it is, however, undeniable
that the practical application of WBS-based UVPDs is largely limited
by the relatively high fabrication cost. In this work, we propose
a new silicon nanowire (Si NW) UVPD that is very sensitive to UVB
light illumination. The Si NWs with a diameter of about 36 nm are
fabricated by a metal-assisted chemical etching method. Performance
analysis revealed that the Si NW device was only sensitive to UVB
light and almost blind to illumination in the visible and near-infrared
regions. Such abnormal spectral selectivity was associated with the
leakage mode resonances (LMRs) of the small diameter, according to
our theoretical simulation. Under 300 nm illumination, the responsivity,
external quantum efficiency, and specific detectivity were estimated
to be 10.2 AW–1, 4.22 × 103%, and
2.14 × 1010 Jones, respectively, which were comparable
to or even higher than those of some WBS-based UVPDs. These results
illustrate that the small dimension Si NWs are potential building
blocks for low-cost and high-performance UVPDs in the future.