2006
DOI: 10.1016/j.mee.2006.01.033
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High-speed data storage and processing for projection mask-less lithography systems

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Cited by 6 publications
(2 citation statements)
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“…With 200x reduction these beams are reduced to 12.5 nm at the wafer substrate within an exposure field of 7.5 m × 7.5 m. With resolution potential beyond 10 nm PML2 is designed to meet the requirements of several upcoming integrated circuit (IC) generations. In [8,9], an advantageous optical interconnected technology for transmit exposure data used in PML2 was introduced. A continuous and reliable parallel data transmission over free-space optics at 1 Gbps per channel was achieved based on the introduced system.…”
Section: Introductionmentioning
confidence: 99%
“…With 200x reduction these beams are reduced to 12.5 nm at the wafer substrate within an exposure field of 7.5 m × 7.5 m. With resolution potential beyond 10 nm PML2 is designed to meet the requirements of several upcoming integrated circuit (IC) generations. In [8,9], an advantageous optical interconnected technology for transmit exposure data used in PML2 was introduced. A continuous and reliable parallel data transmission over free-space optics at 1 Gbps per channel was achieved based on the introduced system.…”
Section: Introductionmentioning
confidence: 99%
“…To achieve effective exposure rates the electronics inside an aperture plate system must be provided with a large amount of data in very short intervals [7]. Data compression is an effective technique for saving storage space and transmission bandwidth, but it has also limitations in a sense.…”
Section: Introductionmentioning
confidence: 99%