2012
DOI: 10.1063/1.4721520
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High-speed metal-insulator transition in vanadium dioxide films induced by an electrical pulsed voltage over nano-gap electrodes

Abstract: We report the fabrication of VO2-based two terminal devices with ∼125-nm gaps between the two electrodes, using a simple, cost-effective method employing optical lithography and shadow evaporation. Current-voltage characteristics of the obtained devices show a main abrupt metal-insulator transition (MIT) in the VO2 film with voltage threshold values of several volts, followed by secondary MIT steps due to the nanostructured morphology of the layer. By applying to the two-terminal device a pulsed voltage over t… Show more

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Cited by 121 publications
(100 citation statements)
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“…2a A notable aspect of the I-V curves measured on our devices is that the electrically-driven resistance change (ΔR E = R(Off)/R(On)) is about three orders of magnitude across the E-MIT, essentially equivalent to the thermally-driven resistance change (ΔR T ) measured in R-T from room temperature to 100 °C. The ΔR E observed is significantly larger than most literature reports, [2][3][4][5][6][7][8] as noted in the introduction, and the comparable ΔR E and ΔR T values suggest that the full VO 2 device volume is being switched. In the above cited references, film thicknesses and metrology for determining ΔR E are similar to our study, and thus it is reasonable to make a direct comparison.…”
Section: A DC Characterizationmentioning
confidence: 50%
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“…2a A notable aspect of the I-V curves measured on our devices is that the electrically-driven resistance change (ΔR E = R(Off)/R(On)) is about three orders of magnitude across the E-MIT, essentially equivalent to the thermally-driven resistance change (ΔR T ) measured in R-T from room temperature to 100 °C. The ΔR E observed is significantly larger than most literature reports, [2][3][4][5][6][7][8] as noted in the introduction, and the comparable ΔR E and ΔR T values suggest that the full VO 2 device volume is being switched. In the above cited references, film thicknesses and metrology for determining ΔR E are similar to our study, and thus it is reasonable to make a direct comparison.…”
Section: A DC Characterizationmentioning
confidence: 50%
“…In this case, the switch is regarded as On before the oscillations dampen out. This is the definition typically found in the VO 2 E-MIT literature, 2,8,9 although it may not be as relevant as the former definition for electronic device design. With this definition based solely on the voltage jump, we have Δt j = 14.1 ± 2.7 ns, of the same order as quoted in the literature cited above considering differences in device dimensions.…”
Section: B Transient Analysis Of Electrical Switchingmentioning
confidence: 99%
“…In the work [92], it is determined as 4.5 ns for the interelectrode gap of d = 125 nm in a planar switch. Theoretical estimates, which are consistent with the experimental data, yield t d ≈ 1 ns for d = 20 nm [93].…”
Section: Transition Mechanism: the Role Of Electron Correlationsmentioning
confidence: 99%
“…Thus, in VO 2 the MIT occurs at a certain n = n с , and it does not matter what is the way of the initiation of this transition -either under heating up to Т = Т t (i.e. as the result of the equilibrium thermal generation of carriers), or under photo-generation [63], [64], [86]- [91], injection [44], or high-field generation at switching [51], [52], [68], [92]- [94]. The transition at n = n c (T < T t ) is equivalent to the fact that the value of T t decreases with increasing electron density [68].…”
Section: Electronic Control Of the Mit At Switchingmentioning
confidence: 99%
“…[1][2][3][4] Currently, geometries at the nanoscale are patterned primarily via serial writing tools such as scanning-electron-beam lithography, scanning-ion-beam lithography, and scanningprobe lithography. Although these tools offer high resolution and flexibility, their slow writing speeds prevent patterning of nanostructures over large areas.…”
mentioning
confidence: 99%