2014 IEEE Bipolar/BiCMOS Circuits and Technology Meeting (BCTM) 2014
DOI: 10.1109/bctm.2014.6981279
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High-speed, waveguide Ge PIN photodiodes for a photonic BiCMOS process

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Cited by 23 publications
(6 citation statements)
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“…The observed bias behavior (higher bandwidth with increased reverse bias) indicates as well that the bandwidth behavior (of both diodes) is not limited by transit times. An additional, but often neglected effect which can limit the bandwidth of photodiodes is photo carrier diffusion [13]. Assuming that diffusion is the bandwidth-limiting effect for the diodes under investigation and that the new diode structure leads to reduced diffusion length would qualitatively explain the improvement.…”
Section: Figure 5 Compares C-v and Dark I-v Curves Of Old And New Ge mentioning
confidence: 99%
“…The observed bias behavior (higher bandwidth with increased reverse bias) indicates as well that the bandwidth behavior (of both diodes) is not limited by transit times. An additional, but often neglected effect which can limit the bandwidth of photodiodes is photo carrier diffusion [13]. Assuming that diffusion is the bandwidth-limiting effect for the diodes under investigation and that the new diode structure leads to reduced diffusion length would qualitatively explain the improvement.…”
Section: Figure 5 Compares C-v and Dark I-v Curves Of Old And New Ge mentioning
confidence: 99%
“…In ongoing works, drivers and TIAs matching to the NMD modulator properties are being developed. In the next step, the IHP technology offers the possibility to monolithically cointegrate driver electronics and photonics [7,8].…”
Section: Discussionmentioning
confidence: 99%
“…Bandwidth improvement results from two measures which lower the impact of "slow" photo carrier diffusion. First, ECS Transactions, 75 (8) 121-139 (2016) lateral dimensions of doped Ge regions were reduced and second, non-doping implants were used for diffusion length manipulation (13). The first measure also reduces free carrier absorption contributing to the responsivity gain.…”
Section: Process Technologymentioning
confidence: 99%