High-temperature tribological behaviour of sputtered NbNx thin films

Fontalvo, G.A.; Terziyska, Velislava L.; Mitterer, Christian

doi:10.1016/j.surfcoat.2007.07.043

Cited by 38 publications

(39 citation statements)

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“…This means that interface formation does not result in a strengthening of the nanocomposites based on NbN/SiN x from a chemical bonding perspective, as was shown for TiN/SiN x heterostructures [53]. Due to symmetry and the specific electronic structure of different phases of NbN [54] the values of s T for the hexagonal structures are higher than for the cubic ones, for which reason the mechanical characteristics for ε-NbN films should be higher than for δ-NbN ones, in agreement with experiments [14,15]. Several important features can be gained from these calculations to understand experimental findings.…”

Section: Theoretical Results and The Interpretation Of Experimental Datasupporting

confidence: 86%

“…The hardness of the NbN films deposited by different arc deposition systems reaches 34-49 GPa [8][9][10][11][12][13]. The NbN films were also prepared by using magnetron sputtering (MS) [14][15][16][17][18], ion Contents lists available at ScienceDirect journal homepage: www.elsevier.com/locate/ceramint beam assisted deposition [19], pulsed laser deposition [20]. An increase in hardness was reached by the formation of the nanocomposite or nanolayered structures in ternary Nb-Si-N films [21][22][23][24][25][26][27][28][29].…”

Section: Introductionmentioning

confidence: 99%

“…It was shown that the NbN system crystallizes in different structural phases: cubic δ-NbN (a small number of vacancies are present in both the sublattices, space group Fm-3m) and hexagonal ε-NbN (space group P-6 m2) and δ ′-NbN (space group P6 3 /mmc), depending on deposition parameters. The formation of the hexagonal phases occurs at high nitrogen partial pressures and substrate biases [14][15][16]18]. The hardness of the hexagonal δ′ and ε phases of NbN is higher compared to that of the cubic δ-NbN [14,15].…”

Section: Introductionmentioning

confidence: 99%

“…The formation of the hexagonal phases occurs at high nitrogen partial pressures and substrate biases [14][15][16]18]. The hardness of the hexagonal δ′ and ε phases of NbN is higher compared to that of the cubic δ-NbN [14,15]. The addition of silicon up to 3.4 at% led to an increase in hardness up to 53 GPa [21].…”

Section: Introductionmentioning

confidence: 99%

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Structural and mechanical properties of NbN and Nb-Si-N films: Experiment and molecular dynamics simulations

Pogrebnjak

Бондар

Abadias

et al. 2016

Ceramics International

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a b s t r a c tThe structural and mechanical properties of NbN and Nb-Si-N films have been investigated both experimentally and theoretically, in their as-deposited and annealed states. The films were deposited using magnetron sputtering at substrate bias (U B ) between 0 and À 70 V. While NbN films were found to crystallize in the cubic δ-NbN structure, Nb-Si-N films with Si content of 11-13 at% consisted of a twophases nanocomposite structure where δ-NbN nanocrystals were embedded in SiN x amorphous matrix.Films deposited at U B ¼0 V were highly (001)-textured. Application of substrate bias potential led to a depletion of light atoms, and caused a grain size refinement concomitantly with the increase of (111) preferred orientations in both films. The maximum hardness was 28 GPa and 32 GPa for NbN and Nb-Si-N films, respectively. NbN and Nb-Si-N films deposited at U B ¼ À70 V exhibited compressive stress of À 3 and À 4 GPa, respectively. After vacuum annealing, a decrease in the stress-free lattice parameter was observed for both films, and attributed to alteration of film composition. To obtain insights on interface properties and related mechanical and thermal stability of Nb-Si-N nanocomposite films, first principles molecular dynamics simulations of NbN/SiN x heterostructures with different structures (cubic and hexagonal) and atomic configurations were carried out. All the hexagonal heterostructures were found to be dynamically stable and weakly dependent on temperature. Calculation of the tensile strain-stress curves showed that the values of ideal tensile strength for the δ-NbN(111)-and ε-NbN(001)-based heterostructures with coherent interfaces and Si 3 N 4 -like Si 2 N 3 interfaces were the highest with values in the range 36-65 GPa, but lower than corresponding values of bulk NbN compound. This suggests that hardness enhancement is likely due to inhibition of dislocation glide at the grain boundary rather than interfacial strengthening due to Si-N chemical bonding.

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Section: Theoretical Results and The Interpretation Of Experimental Datasupporting

confidence: 86%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

Structural and mechanical properties of NbN and Nb-Si-N films: Experiment and molecular dynamics simulations

Pogrebnjak

Бондар

Abadias

et al. 2016

Ceramics International

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“…All of these transition metal nitrides are relatively hard with values ranging from 21 to 25 GPa for TiN, 7-9 from 14 to 22 GPa for CrN 10,11 and from 6 to 45 GPa for NbN, [12][13][14] depending on the deposition technique and its conditions. Moreover, all of these materials are reported to have good wear resistance 6,14,15 and fracture toughness.…”

Section: Introductionmentioning

confidence: 99%

In situ scanning electron microscopy indentation studies on multilayer nitride films: Methodology and deformation mechanisms

et al. 2009

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Systematic studies of the deformation mechanisms of multilayer transition metal nitride coatings TiN/CrN, TiN/NbN, and NbN/CrN, and corresponding reference coatings of TiN, NbN, and CrN deposited by a direct current (dc) magnetron sputtering process onto silicon h100i have been performed. Mechanical characterization was conducted using a combination of microindentation and nanoindentation in the load range 30 to 150 mN and 0.5 to 3.5 mN, respectively. For both load ranges, scanning electron microscopy (SEM) in situ indentation was used to observe the indentation process including any pileup, sink-in, and fracture mechanisms specific to each coating. The coatings' microstructure, both before and after indentation, was analyzed using transmission electron microscopy (TEM). It was possible to both correlate the indentation load-displacement response to surface roughness effects and fracture modes (substrate and film cracking) and observe deformation mechanisms within the coatings.

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Magnetron Sputtered Thin Films Based on Transition Metal Nitride: Structure and Properties

Bharani

Sharma

2022

Physica Status Solidi (a)

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Transition metal nitride (TMN) thin films exhibit outstanding physical, chemical, and mechanical properties, making them best suitable for a wide variety of applications. The most commonly used technique to produce metal nitride thin films with specific properties at optimum conditions is magnetron sputtering. Considering this, this review begins with advancements in the sputtering process from basic diode sputtering to the most commonly used pulsed magnetron sputtering. Further, the literature on several TMNs deposited via magnetron sputtering is summarized, referring to several articles that have been published during the last decades. The main emphasis lies on nitride-based thin films' structural, morphological, and mechanical aspects for various applications. In addition, the influence of reactive gas flow rate, substrate temperature, layer thickness, postannealing temperature, substrate bias voltage, protective layers, the sputtering technique adopted, etc. on the quality and performance of the thin films is also focused. The overall review work can be beneficial for the students and researchers in understanding the basic sputtering phenomenon with its advancements, the relationship between deposition parameters and surface properties, and to know the current research trend for exploring several research gaps in the literature.

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High-temperature tribological behaviour of sputtered NbNx thin films

Cited by 38 publications

References 35 publications

Structural and mechanical properties of NbN and Nb-Si-N films: Experiment and molecular dynamics simulations

Structural and mechanical properties of NbN and Nb-Si-N films: Experiment and molecular dynamics simulations

In situ scanning electron microscopy indentation studies on multilayer nitride films: Methodology and deformation mechanisms

Magnetron Sputtered Thin Films Based on Transition Metal Nitride: Structure and Properties

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