Highly Angle-tolerant Spectral Filter Based on an Etalon Resonator Incorporating a High Index Cavity

Noh, Tae-Hui; Yoon, Yeo-Taek; Lee, Sang‐Shin; Choi, Duk‐Yong; Lim, Seung-Chan

doi:10.3807/josk.2012.16.3.299

Cited by 8 publications

(3 citation statements)

References 13 publications

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“…Given these reasons, thin film devices are investigated as the alternative method. Tae-Hui Noh17 and L. Jay Guo18 demonstrated that the high refractive index material such as TiO 2 and Si 3 N 4 can be employed as the spacing dielectric layer to reduce the dependence of the viewing angle for the Fabry-Perot cavity-based spectral filter. Meanwhile, Mikhail A. Kats proposed a scheme using ultra-thin highly absorbing film on a metallic substrate to produce various colors with a low sensitivity to the incidence angle19.…”

mentioning

confidence: 99%

Compact Multilayer Film Structure for Angle Insensitive Color Filtering

Yang

Shen

Zhang

et al. 2015

Sci Rep

131

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Here we report a compact multilayer film structure for angle robust color filtering, which is verified by theoretical calculations and experiment results. The introduction of the amorphous silicon in the proposed unsymmetrical resonant cavity greatly reduces the angular sensitivity of the filters, which is confirmed by the analysis of the phase shift within the structure. The temperature of the substrate during the deposition is expressly investigated to obtain the best optical performance with high peak reflectance and good angle insensitive color filtering by compromising the refractive index of dielectric layer and the surface roughness of the multilayer film. And the outlayer of the structure, worked as the anti-reflection layer, have an enormous impact on the filtering performance. This method, described in this paper, can have enormous potential for diverse applications in display, colorful decoration, anti-counterfeiting and so forth.

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mentioning

confidence: 99%

Compact Multilayer Film Structure for Angle Insensitive Color Filtering

Yang

Shen

Zhang

et al. 2015

Sci Rep

131

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“…As depicted in Figure , the proposed transmission‐type LVF adopts a conventional MDM configuration of Ag‐TiO 2 ‐Ag that is formed on a glass substrate. The top Ag layer is overlaid with an SiO 2 film, which can act as an anti‐reflection coating to improve the transmission efficiency and prevent the Ag from being corroded . The transmission of a Fabry–Perot etalon with an MDM configuration is characterized as

T = {(1 - r)}^{2} / true(1 + r^{2} - 2 r \cos δ true)

, where r is the reflection coefficient of the metal film and δ is the accumulated total phase during a single round‐trip within the cavity.…”

Section: Design Of the Proposed Linear Variable Filtermentioning

confidence: 99%

Linear variable filter enabling an enhanced wavelength gradient based on shadow‐mask sputtering

Gao

Park

et al. 2017

Micro & Optical Tech Letters

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A linear variable filter (LVF) that improves the wavelength gradient is proposed, and a sample is manufactured using a radio frequency sputtering technique with the help of a vertical shadow mask, which simplifies the fabrication process. The LVF is based on a metal-dielectric-metal Fabry-Perot etalon, wherein the dielectric cavity is tapered in thickness along the device so that the resonance wavelength can be continuously tuned at various positions. The produced device shows a filtering range from 443 nm to 602 nm over a distance of 16 mm, which corresponds to a wavelength gradient of 10 nm/mm. The measured spectra exhibited, on average, a peak transmission of 39% and a spectral bandwidth of 46 nm. K E Y W O R D SFabry-Perot etalon, optical device fabrication, optical filters, thin film devices 1 | I NT RODU CTI ON A linear variable filter (LVF) has been extensively investigated as a crucial element for a wide range of spectroscopic applications, including hyperspectral imaging, 1,2 sensing, 3,4 and compact spectrometry. 5-10

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“…Metal–insulator–metal (MIM) cavitiesa metallic form of the FP cavity , have been widely shown to provide comparable high transmission efficiency narrowband performance, without the requirement for many dielectric layers. − MIM-based filters have been proposed for simpler CFA stack architectures; − however, as with the all-dielectric approach, each cavity height (spectral band) requires a separate lithographic step. A potential solution to this is to utilize analog lithographic techniques to control FP cavity height.…”

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confidence: 99%

Grayscale-to-Color: Scalable Fabrication of Custom Multispectral Filter Arrays

Williams¹,

Gordon²,

Gruber³

et al. 2019

ACS Photonics

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Snapshot multispectral image (MSI) sensors have been proposed as a key enabler for a plethora of multispectral imaging applications, from diagnostic medical imaging to remote sensing. With each application requiring a different set, and number, of spectral bands, the absence of a scalable, cost-effective manufacturing solution for custom multispectral filter arrays (MSFAs) has prevented widespread MSI adoption. Despite recent nanophotonic-based efforts, such as plasmonic or high-index metasurface arrays, large-area MSFA manufacturing still consists of many-layer dielectric (Fabry–Perot) stacks, requiring separate complex lithography steps for each spectral band and multiple material compositions for each. It is an expensive, cumbersome, and inflexible undertaking, but yields optimal optical performance. Here, we demonstrate a manufacturing process that enables cost-effective wafer-level fabrication of custom MSFAs in a single lithographic step, maintaining high efficiencies (∼75%) and narrow line widths (∼25 nm) across the visible to near-infrared. By merging grayscale (analog) lithography with metal–insulator–metal (MIM) Fabry–Perot cavities, whereby exposure dose controls cavity thickness, we demonstrate simplified fabrication of MSFAs up to N-wavelength bands. The concept is first proven using low-volume electron beam lithography, followed by the demonstration of large-volume UV mask-based photolithography with MSFAs produced at the wafer level. Our framework provides an attractive alternative to conventional MSFA manufacture and metasurface-based spectral filters by reducing both fabrication complexity and cost of these intricate optical devices, while increasing customizability.

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Highly Angle-tolerant Spectral Filter Based on an Etalon Resonator Incorporating a High Index Cavity

Cited by 8 publications

References 13 publications

Compact Multilayer Film Structure for Angle Insensitive Color Filtering

Compact Multilayer Film Structure for Angle Insensitive Color Filtering

Linear variable filter enabling an enhanced wavelength gradient based on shadow‐mask sputtering

Grayscale-to-Color: Scalable Fabrication of Custom Multispectral Filter Arrays

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