“…Therefore, SERS platforms with considerable enhancement have been demonstrated through a number of methods, including laser interference lithography [4], deep UV lithography [11], galvanic displacement reaction [12,13], e-beam lithography [10,11] and evaporation (or magnetron sputtering) [14,15]. However, these methods are time consuming, complicated and not applicable to large scale production [16,17]. Moreover, uniformity and reproducibility of SERS devices are highly critical for the effective use of SERS in commercial applications.…”