InN is still the least studied material among III‐nitrides and there are several problems to be overcome for better understanding of its material properties and also its material control for device application. In particular, successful p‐type doping is a quite important issue but quite difficult in InN. In this article, we present a study on the latest advances in material control paying special attention to the p‐type doping of InN films using Mg‐acceptors by MBE, the demonstration of successful p‐type control and p‐type conduction, and their electrical and optical properties as well. Furthermore, as a prerequisite of successful p‐type doping of InN, epitaxy behaviors of InN on GaN and effects of threading dislocations on high‐purity undoped InN epilayers grown on GaN template are also discussed.