2020
DOI: 10.1021/acsaelm.0c00433
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Hybrid GaAsSb/GaAs Heterostructure Core–Shell Nanowire/Graphene and Photodetector Applications

Abstract: We report the growth of vertical, high-quality GaAs0.9Sb0.1 nanowires (NWs) with improved density on oxygen (O2) plasma-treated monolayer graphene/SiO2/p-Si­(111) by self-catalyzed molecular beam epitaxy. An O2 plasma treatment of the graphene under mild conditions enabled modification of the surface functionalization and improved reactivity of the graphene surface to semiconductor adatoms. The rise in the disorder peak of the Raman mode, decreased surface conductivity, and creation of additional O2 groups of … Show more

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Cited by 19 publications
(9 citation statements)
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“…33 Although the experimental results clearly show a correlation between ZnPc growth, the type of substrate, and the number of graphene layers, SEM images of ZnPc deposited under two different flux regimes are not sufficient to decipher the fundamental mechanisms responsible for the morphology change. These mechanisms include a change in (i) structural defect in graphene, 47,48 (ii) surface energy, 49 (iii) mechanical strain, 50 and (iv) electrostatic doping 51 or even (v) a change in the substrate-induced polar field through graphene. 30 In order to identify the major factors responsible for ZnPc morphological change, Raman spectroscopy has been carried out on each graphene substrate (see Figure 6).…”
Section: ■ Results and Discussionmentioning
confidence: 99%
“…33 Although the experimental results clearly show a correlation between ZnPc growth, the type of substrate, and the number of graphene layers, SEM images of ZnPc deposited under two different flux regimes are not sufficient to decipher the fundamental mechanisms responsible for the morphology change. These mechanisms include a change in (i) structural defect in graphene, 47,48 (ii) surface energy, 49 (iii) mechanical strain, 50 and (iv) electrostatic doping 51 or even (v) a change in the substrate-induced polar field through graphene. 30 In order to identify the major factors responsible for ZnPc morphological change, Raman spectroscopy has been carried out on each graphene substrate (see Figure 6).…”
Section: ■ Results and Discussionmentioning
confidence: 99%
“…The ballistic ejection of carbon atoms from graphene materials by irradiation has been reported and it was responsible for the abundance of point defects. [98][99][100] The synthesis of engineered defects in 2D graphene materials has been extensively studied. For example, Villarreal et al 101 have recently published research on defect formation in graphene materials due to the breaking of C-C bonds and development of C-substrate bonds by ultralow energy (15-40 eV) ion implantation (with He, Ne and Ar).…”
Section: Ion Implantationmentioning
confidence: 99%
“…Among various ternary III-V-V compound material systems, GaAsSb is attractive for the photodetector application due to their phase purity, higher carrier mobility, ease of bandgap engineering by simply varying the Sb composition, and most importantly, better understood Sb surfactant effect in engineering the NW growth kinetics and the NW properties [8][9][10][11][12]. Further, the bandgap of GaAsSb also encompasses the low loss near-infrared telecommunication wavelength range [8][9][10][11][12], with wide-ranging applications in light detection and ranging for the autonomous vehicle application and the optical interconnects in supercomputers. III-V p-i-n NWs are realized in both different configurations and different material systems.…”
Section: Introductionmentioning
confidence: 99%