2008
DOI: 10.1063/1.2967731
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Hybrid metal-base transistor with base of sulfonated polyaniline and fullerene emitter

Abstract: Articles you may be interested inElectronic transport characteristics of electrolyte-gated conducting polyaniline nanowire field-effect transistors Appl. Phys. Lett. 95, 013113 (2009); 10.1063/1.3176444 Improvement of the electrical performance in metal-induced laterally crystallized polycrystalline silicon thinfilm transistors by crystal filtering

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Cited by 24 publications
(13 citation statements)
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“…2,6 Following the backside contact evaporation, a 220 nm thick SPAN layer was deposited onto the SiC epitaxial layer at a rate of 1.8 nm/h by adopting a procedure based on the process first developed by Yang et al 27 and described in Ref. 6, except that the metanilic acid and aniline amounts (1.715 g and 455 ll, respectively) and the growth temperature (10 C) are different. Finally, a circular gate contact (with area A ¼ 0.0020 cm 2 and thickness 180 nm) was obtained by thermal evaporation of 99.99% Au on the SPAN film.…”
Section: A Device Fabricationmentioning
confidence: 99%
“…2,6 Following the backside contact evaporation, a 220 nm thick SPAN layer was deposited onto the SiC epitaxial layer at a rate of 1.8 nm/h by adopting a procedure based on the process first developed by Yang et al 27 and described in Ref. 6, except that the metanilic acid and aniline amounts (1.715 g and 455 ll, respectively) and the growth temperature (10 C) are different. Finally, a circular gate contact (with area A ¼ 0.0020 cm 2 and thickness 180 nm) was obtained by thermal evaporation of 99.99% Au on the SPAN film.…”
Section: A Device Fabricationmentioning
confidence: 99%
“…Subsequent to the backside electrical deposition, a 200 nm thick SPAN thin film was deposited onto the (100), (311)A and (311)B GaAs epitaxial layer at a rate of 1.8 nm/h by adopting a procedure based on the process initially developed by Yang et al [32] and described in Ref. [13], except that the aniline and metanilic acid amounts (455 μl and 1.715 g, respectively) and the growth temperature …”
Section: Devices Fabricationmentioning
confidence: 99%
“…For this, after the cleaning process of substrates, a backside electrical contact of nickel (Ni)-gold (Au) was deposited by thermal evaporation using a BOC Edwards 306 system. For more details see procedure described elsewhere [13,33]. Subsequent to the backside electrical deposition, a 200 nm thick SPAN thin film was deposited onto the (100), (311) …”
Section: Devices Fabricationmentioning
confidence: 99%
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“…The plate (item E) fits into its support (item D), as shown in figure 1, and is made of Polymethyl Methacrylate (PMMA), which has a refractive index of 1.49624 for the wavelength of 505nm [15], [16]. The plate is composed of three parts: waveguide, detection spot, and mechanical alignment locks.…”
Section: Methodsmentioning
confidence: 99%