“…To introduce a periodic structural pattern into otherwise flat, continuous thin films of perovskite nanocrystals, the most straightforward method is through depositing the colloidal nanocrystals onto a prestructured substrate. This approach was previously successfully employed to generate enhanced directional PL, , manufacturing nanolasers, − photodetectors, and solar cells. , However, such an indirect patterning method lacks the possibility of creating more complex, multicomponent metasurfaces, provides suboptimal electromagnetic energy confinement, and relies on an elaborate substrate preparation . At the same time, direct patterning through ultraviolet (UV) or electron beam lithography (EBL) increases the risks of material degradation. − Some of these approaches have been explored for the patterning of metal halide perovskites, yet they present various challenges, including fabrication on a large scale and material degradation during processing. , A more appealing, low-cost, and scalable approach implies direct patterning of perovskite thin films through confinement self-assembly, where the colloidal solution of perovskite nanocrystals (or their precursors that are further turned into a solid crystalline phase) is confined on the substrate by a structured stamp. ,− As such, hard silicon (Si) stamps or glasslike molds were successfully employed to create structured metasurfaces with improved crystallinity , for modifying the emission properties ,,− and for photovoltaic applications. − However, the use of hard stamps requires additional surface modification and operation at high pressure and temperature.…”