Hydrogenated amorphous carbon films prepared by plasma-enhanced chemical-vapor deposition

Abstract

Hydrogenated amorphous carbon films have been prepared from CH4, H2, and Ar mixtures by plasma-enhanced chemical-vapor deposition. Films with various physical properties were obtained from different deposition conditions. The deposition parameters varied included H2 flow rates, Ar flow rates, total pressures, substrate temperatures, and power densities. Effects of each deposition parameter on the microstructures and the kinetics involved in the formation of each film are discussed. In addition, relations between deposition conditions, microstructures, and the optical properties are reported.

Nanostructure, structural stability, and diffusion characteristics of layered coatings for heat-assisted magnetic recording head media

“…Select deposition systems, particularly plasma-enhanced chemical vapor deposition 18,19 and filtered cathodic vacuum arc (FCVA) 20,21 , produce continuous ultrathin carbon films exhibiting predominantly sp 3 hybridization 22 . FCVA enables low-temperature deposition of a -C films with excellent nanomechanical properties and structural stability at an elevated temperature 16 , provided they are sufficiently thick 23 .…”

Infrared Studies on Films of Carbosilazane and Siloxazane Networks

“…From the spectrum of k and the value of n ∞ (the refractive index of the material in the visible range), n can be determined by means of KKA. We used an algorithm that is described in ref 24. For nonmagnetic materials, e ˜) (n + ik) 2 , where ˜is the complex dielectric function. TO and LO functions, whose maxima correspond to the vibrational modes TO and LO, respectively, can be obtained from 22 a These labels correspond to the deposition conditions.…”

“…Plasma-enhanced chemical vapor deposition (PECVD) is a very versatile technique that permits the production of a wide range of materials according to the deposition conditions . Besides carbonaceous materials, such as highly cross-linked organic polymers , and diamond-like coatings, , PECVD has been amply used in the production of silicon-based materials from organosilicon molecular precursors. − One of its advantages is the possibility of synthesizing Si-based materials with controlled amounts of a determined element or chemical group. This can be accomplished in several ways: (i) diluting the precursor molecules in different gases; ,, (ii) heating the substrate; (iii) collecting the film in different regions of the plasma or even out of the plasma; etc.…”

“…Plasma-enhanced chemical vapor deposition (PECVD) is a very versatile technique that permits the production of a wide range of materials according to the deposition conditions. 1 Besides carbonaceous materials, such as highly crosslinked organic polymers 2,3 and diamond-like coatings, 4,5 PECVD has been amply used in the production of siliconbased materials from organosilicon molecular precursors. [6][7][8][9][10][11][12][13][14][15] One of its advantages is the possibility of synthesizing Sibased materials with controlled amounts of a determined element or chemical group.…”

Importance of laboratory experimental studies of silicate grains for exoplanet atmosphere characterization

“…We can mention the measurements of 1) natural single crystals of olivine Mg 1.8 Fe 0.2 SiO 4 in the UV-mid-IR spectral range at temperatures from 300 to 1700 K (Shankland et al, 1979) and olivine Mg 1.8 Fe 0.2 SiO 4 and enstatite MgSiO 3 in the mid-IR range at temperatures from 10 to 973 K (Zeidler et al, 2015), 2) oxides, such as Al 2 O 3 , MgAl 2 O 4 , and SiO 2 , in the mid-IR range from 300 to 900 K (Zeidler et al, 2013), 3) silicon in the UV-VIS range from room temperature up to 800 K (Weakliem and Redfield, 1979;Jellison and Modine, 1994) , 4) amorphous magnesium silicate smokes (Hallenbeck et al, 1998) and amorphous Mg-rich pyroxene particles (Brucato et al, 1999) embedded after annealing at temperatures between 1000 and 1300 in KBr pellets and measured ex situ in the mid-IR spectral range, and crystalline silicates produced by high-temperature (~1000 K) annealing of amorphous silicates, such as MgSiO 3 , Mg 2 SiO 4 , and Fe 2 SiO 4 (Fabian et al, 2000;Roskosz et al, 2011;Sabri et al, 2014). Having in mind possible carbon-rich exoplanetary atmospheres (Helling et al, 2017), it is worth to mention also high-temperature measurements of carbonaceous species, such as hydrogenated amorphous carbon films (Chou, 1992), diamond-like carbon films (Akkerman et al, 1996;Cheng et al, 1997), and nano-crystalline carbon in silicon oxycarbide (Rosenburg et al, 2018).…”