2014
DOI: 10.1364/oe.22.012122
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Hydrogenated amorphous silicon photonic device trimming by UV-irradiation

Abstract: A method to compensate for fabrication tolerances and to fine-tune individual photonic circuit components is inevitable for wafer-scale photonic systems even with most-advanced CMOS-fabrication tools. We report a cost-effective and highly accurate method for the permanent trimming of hydrogenated amorphous silicon photonic devices by UV-irradiation. Microring resonators and Mach-Zehnder-interferometers were utilized as photonic test devices. The MZIs were tuned forth and back over their complete free spectral … Show more

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Cited by 23 publications
(13 citation statements)
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“…Loss of hydrogen in the a‐Si:H film was reported to cause a reduction in the effective refractive index . Also, surface oxidation can reduce the effective refractive index .…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…Loss of hydrogen in the a‐Si:H film was reported to cause a reduction in the effective refractive index . Also, surface oxidation can reduce the effective refractive index .…”
Section: Resultsmentioning
confidence: 99%
“…Loss of hydrogen in the a-Si:H film was reported to cause a reduction in the effective refractive index. [46,47] Also, surface oxidation can reduce the effective refractive index. [13,29,48] The initial slow blue-shift can be related to oxidation of the Adv.…”
Section: Thin-film Interferometrymentioning
confidence: 99%
“…Figures 7(b) and 7(c) illustrate the output spectrum of AWG without and with phase error (corresponding to a width variation of 25 nm). The phase error information can be used for correcting the device characteristics by postfabrication trimming process [13,14] For the given 2 μm SOI AWG, BeamPROP simulation takes nearly 35 min to complete the simulation [Intel(R) core(TM)i7-2600 CPU at 3.40 GHz processor]. AWGs with smaller footprints in 220 nm SOI, having tightly confined modes in photonic wire waveguides, can be simulated accurately by the FDTD method.…”
Section: Phase Error Analysismentioning
confidence: 99%
“…In Si PICs, phase control is a key function for the realization of various important devices such as optical switches, modulators, variable wavelength filters, and coherent receivers [1,2,3,4,5]. It would also be a practical solution for compensating the parasitic phase-shifts stemming from structural size errors in fabricated Si photonic devices [6,7].…”
Section: Introductionmentioning
confidence: 99%