Organic Syntheses 2003
DOI: 10.1002/0471264180.os053.07
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tert‐Butoxycarbonyl‐L‐Proline

Abstract: tert ‐Butoxycarbonyl‐ L ‐proline reactant: 115 g. (1.00 mole) of 1,1,3,3‐tetramethylguanidine product: tert ‐butoxycarbonyl‐ L ‐proline product: Boc‐Ala product: Boc‐Ala … Show more

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Cited by 10 publications
(11 citation statements)
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“…The mobility reduction in the SiON device is believed to be due to Remote Charge Scattering (RCS) from charges at the gate-dielectric interface [7]. The addition of 5 cycles of HfO 2 reduces the mobility further [8].…”
Section: Resultsmentioning
confidence: 99%
“…The mobility reduction in the SiON device is believed to be due to Remote Charge Scattering (RCS) from charges at the gate-dielectric interface [7]. The addition of 5 cycles of HfO 2 reduces the mobility further [8].…”
Section: Resultsmentioning
confidence: 99%
“…Both sites were located on what had been small islands in a lagoon along the coast of southern Scania during the Mesolithic occupations (Larsson 1980(Larsson , 1981(Larsson , 1982(Larsson , 1983(Larsson , 1984a(Larsson , 1984b(Larsson , 1988(Larsson , 1990a(Larsson , 1990b(Larsson , 1993. Both sites were located on what had been small islands in a lagoon along the coast of southern Scania during the Mesolithic occupations (Larsson 1980(Larsson , 1981(Larsson , 1982(Larsson , 1983(Larsson , 1984a(Larsson , 1984b(Larsson , 1988(Larsson , 1990a(Larsson , 1990b(Larsson , 1993.…”
Section: Southern Scandinavian Mesolithic Mortuary Contextsmentioning
confidence: 99%
“…However, a major problem so-called Fermi-level pinning was reported that higher threshold voltage (V th ) was observed especially in pFET when polySi film was used as a gate electrode [3]. This phenomenon was originally explained by gap states induced by Hf-Si bonds at the interface and was shown to occur even after deposition of HfSiO submonolayer on SiO 2 [4,5]. Also, recent paper reported that oxygen vacancies generated in HfSiO layer could be the cause for the pinning [6].…”
Section: Introductionmentioning
confidence: 99%