If it moves, simulate it!

Abstract

In the last 35 years modeling of projection printing has undergone many paradigm shifts in physical models, computational engines, algorithms and opportunities. The trigger event for the first quantitative positive resist Dill model was the development and application of automated thin-film measurement equipment. The use of partial coherence which helps imaging also complicates the understanding and necessitates the use of simulation to guide lithography practice. Simulation has also played an important role in discovery (intensity imbalance in phase-shifting masks), invention (self-interferometric mask monitors) and creation of analysis techniques (first-cut accurate fast-CAD). The current challenges and growth areas for simulation include calibration, synergy with metrology, electronic self-testing and linking circuit design and fabrication.

Nebulous hotspot and algorithm variability in computation lithography

“…Computation lithography owes its current prevalence to algorithm innovations 18 and improvement in computer processing performance over the last few decades. In this virtual world, "realities" are tools that perform useful service for integrated circuit development.…”

Computation lithography: virtual reality and virtual virtuality

“…However, it has taken some time before lithography simulation, the precursor of computation lithography, establishes its present-day credibility. (For readers interested in the history of lithography simulation, they are referred to the articles by Dill [3], Mack [4], and Neureuther [5], which consider it from a few points of view.) Even as late as the 1980s lithography simulation was still labeled by some as "Yesterday's technology simulated tomorrow" [5].…”

Computation Lithography: Virtual Reality and Virtual Virtuality

“…i Even as late as the 1980s lithography simulation was still labeled by some as "Yesterday's technology simulated tomorrow". 5 Nevertheless, the 1970s and 1980s was a germinating period for lithography simulation; many fundamental algorithms were developed. Computation of partially coherent imaging was placed on a firm foundation, 6 permitting accurate simulation of projection printing in the regime where neither the relationship between mask and intensity nor that between objects and image-plane field is linear.…”