Quantum dots (QDs) based on III-nitride semiconductors are promising for single photon emission at non-cryogenic temperatures due to their large exciton binding energies. Here, we demonstrate GaN QD single photon emitters operating at 300 K with g (2) (0) = 0.17±0.08 under continuous wave excitation. At this temperature, single photon emission rates up to 6 × 10 6 s −1 are reached while g (2) (0) ≤ 0.5 is maintained. Our results are achieved for GaN QDs embedded in a planar AlN layer grown on silicon, representing a promising pathway for future interlinkage with optical waveguides and cavities. These samples allow exploring the limiting factors to key performance metrics for single photon sources, such as brightness and single photon purity. While high brightness is assured by large exciton binding energies, the single photon purity is mainly affected by the spectral overlap with the biexcitonic emission. Thus, the performance of a GaN QD as a single photon emitter depends on the balance between the emission linewidth and the biexciton binding energy. We identify small GaN QDs with an emission energy in excess of 4.2 eV as promising candidates for future room temperature applications, since the biexciton binding energy becomes comparable to the average emission linewidth of around 55 meV.Quantum dots (QDs) based on III-V semiconductors have attracted a lot of attention for their use as nonclassical light sources, with the single photon source being the simplest and most elemental representative. Such a source of single photons should be as bright as possible, while retaining a high single photon purity [1, 2]. However, key metrics for such QD-based single photon sources are usually achieved at cryogenic temperatures with the seminal In(Ga)As/(Al)GaAs system [3][4][5]. Identifying a material platform that can enable sufficiently performant single photon sources up to room temperature remains a challenging quest. In this respect, the main contenders are point defects in wide-bandgap semiconductors (2D materials [6] and bulk semiconductors [7, 8]), nitrogen and silicon vacancies in diamond [9], as well as semiconductor QDs [10][11][12]. It would be advantageous to employ a material system with high integrability into a suitable photonic environment that offers epitaxial control. In this regard, III-nitrides offer a unique possibility as bipolar doping can be achieved, foreign and homoepitaxial substrates are available, and growth and processing techniques are well established, leading to their widespread implementation at an industrial scale for solid state lighting.III-nitrides have shown promising advances in terms of single photon emission (SPE) by employing GaN/AlN [13,14], GaN/AlGaN [15,16] and InGaN/GaN QDs [17][18][19][20][21]. Furthermore, SPE at temperatures as high as 350 K [22] and two-photon emission up to 50 K [23] have been demonstrated. The progress towards room temperature operation is directly linked to the exciton-phonon coupling. With rising temperature the phonon bath becomes * sebastian.tamariz...