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NRC Publications Archive Archives des publications du CNRCThis publication could be one of several versions: author's original, accepted manuscript or the publisher's version. / La version de cette publication peut être l'une des suivantes : la version prépublication de l'auteur, la version acceptée du manuscrit ou la version de l'éditeur. For the publisher's version, please access the DOI link below./ Pour consulter la version de l'éditeur, utilisez le lien DOI ci-dessous.http://doi.org/10.1063/1.3082019 Physics, 105, 4, pp. 043517-043517, 2009 Composition and strain contrast of Si 1−x Ge x "x = 0.20… and Si 1−y C y "y Յ 0.015… epitaxial strained films on "100… Si in annular dark field images The annular dark field ͑ADF͒ image contrast of Si 1−x Ge x ͑x = 0.20͒ and Si 1−y C y ͑y Յ 0.015͒ strained epitaxial films on ͑100͒ Si is investigated in a 200 kV scanning transmission electron microscope ͑STEM͒ with ADF detector inner semiangles ranging from 26 to 92 mrad. For the Si 1−x Ge x / Si system, the contrast increases with increasing ADF detector semiangle and decreases with increasing thickness to remain almost constant after the TEM sample thickness reaches 120 nm. The opposite trend is seen in the Si 1−y C y / Si system, where the contrast increases with increasing sample thickness and decreases with increasing ADF detector semiangle, and remains almost constant after the sample thickness exceeds 200 nm. In the dilute Si 1−y C y / Si system the lower average atomic number strained Si 1−y C y layers are brighter than the higher average atomic number Si for an ADF detector semiangle of up to 92 mrad when the sample thickness is greater than 200 nm. This anomalous contrast dependence is also observed for an ADF detector semiangle of up to 50 mrad in thinner TEM samples. The observed ADF-STEM image contrast is explained in relation to the atomic scattering and multislice simulations. The normalized intensity line scan profiles of ADF-STEM images coincide with the composition profiles determined from analytical TEM techniques: energy dispersive x-ray spectroscopy and electron energy loss spectroscopy, as well as secondary ion mass spectrometry.
Journal of Applied