Impact of deposition conditions on nanostructured anisotropic silica thin films in multilayer interference coatings

Grinevičiūtė, Lina; Badorreck, Holger; Jensen, Lars; Ristau, Detlev; Jupé, Marco; Selskis, Algirdas; Tolenis, Tomas

doi:10.1016/j.apsusc.2021.150167

Cited by 10 publications

(16 citation statements)

References 25 publications

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“…When looking at the density profiles of the structures in Figure 9, an improvement to the results in previous works from the authors in collaboration with the Vilnius university in [7] can be presented. The plot shows the mean and standard deviation of the density profiles evaluated for the three repeated simulations.…”

Section: Siomentioning

confidence: 59%

“…In particular, the application of GLAD coatings relies on the proper use of these structural properties, making this coating process ideally suited for evaluation of the simulation results. For the investigation the thin film growth of TiO 2 and SiO 2 is analyzed, while the recent publications from Badorreck et al and Grineviciute et al [6,7] serve as a basis. The growth of the thin films is investigated by means of atom deposition within the framework of classical molecular dynamics.…”

Section: Methodsmentioning

confidence: 99%

“…Grineviciute et al [7] analyzed also birefringent properties, here of SiO 2 serial bideposition coatings, with the emphasis on the effect through continued coating onto these porous structures, which is essential for the application in all silica GLAD coatings. Here, the first layer grown by serial bi-deposition is performed for two different substrate areas of 16 × 7 nm 2 and 30 × 20 nm 2 , while the growth of the second layer is repeatedly simulated for the one with 16 × 7 nm 2 .…”

Section: Methodsmentioning

confidence: 99%

“…In addition, the computational effort and numerical precision have to be carefully balanced for each individual sub-area of the virtual coating. Atomistic models are employed to explore the nanostructure properties of the thin films [1,4,5], while glancing angle deposition (GLAD) is of high interest due to its concise nanostructure [6][7][8]. Results that correspond well between experiment and simulation have already been obtained [6,7] taking into account the size of the simulated structures.…”

Section: Introductionmentioning

confidence: 99%

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Statistical Analysis on the Structural Size of Simulated Thin Film Growth with Molecular Dynamics for Glancing Angle Incidence Deposition

et al. 2021

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For the purpose of a deeper understanding of thin film growth, in the last two decades several groups developed models for simulation on the atomistic scale. Models using molecular dynamics as their simulation method already give results comparable to experiments, however statistical analysis of the simulations themselves are lacking so far, reasoned by the limits imposed by the computational power and parallelization that can only be used in lateral dimensions. With advancements of software and hardware, an increase in simulation speed by a factor of up to 10 can be reached. This allows either larger structures and/or more throughput of the simulations. The paper analyses the significance of increasing the structure size in lateral dimensions and also the repetition of simulations to gain more insights into the statistical fluctuation contained in the simulations and how well the coincidence with the experiment is. For that, glancing angle incidence deposition (GLAD) coatings are taken as an example. The results give important insights regarding the used interaction potential, the structure size and resulting important differences for the density, surface morphology, roughness and anisotropy. While larger structures naturally can reproduce the real world in more detail, the results show which structure sizes are needed for these aspects without wasting computational resources.

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Section: Siomentioning

confidence: 59%

Section: Methodsmentioning

confidence: 99%

Section: Methodsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Statistical Analysis on the Structural Size of Simulated Thin Film Growth with Molecular Dynamics for Glancing Angle Incidence Deposition

et al. 2021

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“…Glancing angle deposition (GLAD) [1] can be used to make highly anisotropic thin films for light polarisation control, namely waveplates suited for the linear and circular polarisations [2,3] and polarisers for zero angle of incidence [4], by utilising complex arrangements of sample's tilt and rotation [5]. It becomes possible to make strongly birefringent thin films by GLAD using optically isotropic Si and SiO 2 materials [6]. It was recently demonstrated that such films have larger visible and near-infrared (near-IR) laser damage thresholds in J/cm 2 compared to polished surfaces or coatings made out of the two different materials [7].…”

Section: Introductionmentioning

confidence: 99%

Anisotropy of 3D Columnar Coatings in Mid-Infrared Spectral Range

Grinevičiūtė

Han

et al. 2021

Nanomaterials

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Polarisation analysis in the mid-infrared fingerprint region was carried out on thin (∼1 μm) Si and SiO2 films evaporated via glancing angle deposition (GLAD) method at 70∘ to the normal. Synchrotron-based infrared microspectroscopic measurements were carried out on the Infrared Microspectroscopy (IRM) beamline at Australian Synchrotron. Specific absorption bands, particularly Si-O-Si stretching vibration, was found to follow the angular dependence of ∼cos2θ, consistent with the absorption anisotropy. This unexpected anisotropy stems from the enhanced absorption in nano-crevices, which have orientation following the cos2θ angular dependence as revealed by Fourier transforming the image of the surface of 3D columnar films and numerical modeling of light field enhancement by sub-wavelength nano-crevices.

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RGB‐Color Image Analysis for Determination of Birefringence of Micro‐Films and Columnar Coatings

Ryu

Han

Grinevičiūtė

et al. 2022

Laser & Photonics Reviews

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The birefringence analysis of thin ≈13.33333ptμ$\approx 1\hspace*{3.33333pt}\umu $m SiO2 films deposited via evaporation at a glancing angle of 3.33333pt70∘$\hspace*{3.33333pt}{70}^{\circ}$ to the normal on resist pillar arrays on Si and nanopatterned SiO2 substrates is carried out by spectral and color (red–green–blue [RGB]) imaging modes. Retardance and birefringence of the films deposited over flat and structured regions can be distinguished with only ≈1% difference between neighboring regions for the visible spectral range using RGB numerical analysis of images. The Michel‐Lévy color map is used for color rendering of birefringence to make quantitative measurements by numerical RGB color filtering. It is shown that by using λ/2$\lambda /2$ at 530 nm waveplate inserted at π/4$\pi /4$ angle to the cross polarizer‐analyzer setup, the range of changes in chromaticity xy‐coordinates expands approximately twice upon angular rotation of a birefringent sample. This facilitates a better signal‐to‐noise determination of birefringence. The proposed method with λ/2$\lambda /2$‐plate color shifting can be directly used to determine birefringence from step‐like spectral features in reflection and transmission polariscopy. Direct measurement of birefringence (normalΔn=0.023${\Delta}n=0.023$) and retardance of SiO2 chevron film is carried out using Berek compensator as a benchmark.

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Impact of deposition conditions on nanostructured anisotropic silica thin films in multilayer interference coatings

Cited by 10 publications

References 25 publications

Statistical Analysis on the Structural Size of Simulated Thin Film Growth with Molecular Dynamics for Glancing Angle Incidence Deposition

Statistical Analysis on the Structural Size of Simulated Thin Film Growth with Molecular Dynamics for Glancing Angle Incidence Deposition

Anisotropy of 3D Columnar Coatings in Mid-Infrared Spectral Range

RGB‐Color Image Analysis for Determination of Birefringence of Micro‐Films and Columnar Coatings

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