2015
DOI: 10.1103/physrevapplied.4.044002
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Impact of the Capacitance of the Dielectric on the Contact Resistance of Organic Thin-Film Transistors

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Cited by 34 publications
(42 citation statements)
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“…In terms of device structure, bottom‐contact (BC) structure typically exhibits larger R C than top‐contact structure (TC) does, if with the same bottom‐gate . Recent drift‐diffusion‐based simulations performed a prediction that BC organic FETs may exhibit lower R C than otherwise equivalent TC ones, which was proven by a subsequent study . The BC and TC 2,9‐diphenyl‐dinaphtho‐[2,3‐ b :2′,3′‐f]thieno[3,2‐ b ]thiophene (DPh‐DNTT) OFET with different thicknesses of aluminum oxide dielectric were fabricated as shown in Figure h–k.…”
Section: Optimization Of Nonideal Ofetsmentioning
confidence: 88%
“…In terms of device structure, bottom‐contact (BC) structure typically exhibits larger R C than top‐contact structure (TC) does, if with the same bottom‐gate . Recent drift‐diffusion‐based simulations performed a prediction that BC organic FETs may exhibit lower R C than otherwise equivalent TC ones, which was proven by a subsequent study . The BC and TC 2,9‐diphenyl‐dinaphtho‐[2,3‐ b :2′,3′‐f]thieno[3,2‐ b ]thiophene (DPh‐DNTT) OFET with different thicknesses of aluminum oxide dielectric were fabricated as shown in Figure h–k.…”
Section: Optimization Of Nonideal Ofetsmentioning
confidence: 88%
“…The current lowest measured contact resistance for an OFET was reported by Borchert et al as R C = 29 Ω cm for bottom gate, bottom contact devices with an ultra‐thin (5.3 nm) gate dielectric . This work is the culmination of a series of reports that identified the importance of the gate dielectric layer on the OFET contact resistance, combined with chemically modifying the contacts using a self‐assembled monolayer of pentafluorobenzenethiol (PFBT). It should be noted that the devices were operated at gate–source and drain–source voltages ( V GS and V DS , respectively) less than 3 V, and produced mobilities of 5 cm 2 V −1 s −1 , record subthreshold swings of 62 mV decade −1 , on/off ratios of 10 9 , and ring oscillator stage delays of down to 138 ns, all enhanced by low R C .…”
Section: Introductionmentioning
confidence: 90%
“…Second, the contact resistance is independent of the thickness of the semiconductor layer, which is beneficial whenever precise control of this thickness is difficult, as in the case of vacuum‐deposited small‐molecule semiconductors. Third, the contact resistance in coplanar TFTs depends strongly on the thickness of the gate dielectric and can thus, in principle, be reduced in a direct and systematic manner. For coplanar organic TFTs with a gate‐dielectric thickness of 5.3 nm, a contact resistance of 30 Ω cm was recently reported, resulting in an equivalent frequency of 3.5 MHz at 1.6 V (2.2 MHz V −1 ) in ring oscillators based on TFTs with a channel length of 1 μm and gate overlaps of 2 μm, and a transit frequency of 10.4 MHz at 3 V (3.5 MHz V −1 ) obtained from S ‐parameter measurements on TFTs with a channel length of 0.85 μm and gate overlaps of 5 μm (see Figure ).…”
Section: Resultsmentioning
confidence: 99%
“…Figure b shows the transit frequency at a drain–source voltage of 3 V calculated using Equation and plotted as a function of the width‐normalized contact resistance for the dimensions of the TFT in Figure ( L = 0.85 μm, L ov = 5 μm) and for the minimum dimensions achievable by stencil lithography ( L = 0.3 μm, L ov = 2 μm). Figure b indicates that the highest transit frequency that can realistically be expected for organic TFTs fabricated by stencil lithography is ≈30 MHz at 3 V for a contact resistance of 30 Ω cm and ≈100 MHz at 3 V in the event that the contact resistance can be reduced to about 5 Ω cm, e.g., by functionalizing the contact surfaces with better‐performing molecules or by reducing the gate‐dielectric thickness …”
Section: Resultsmentioning
confidence: 99%